Method for manufacturing a nanstructure

Abstract

The invention relates to a method for fabricating a nanostructure, comprising the selection of a carrier for the material of the nanostructure during the formation of the same, wherein the carrier is provided with a shape that corresponds with the final shape of the nanostructure, and wherein the nanostructure material is applied on the carrier in a predetermined thickness and following the shape of the carrier. The material is removed substantially isotropically from the side facing away from the carrier, with the result that material that is not removed is left on a place or places determined by the shape of the carrier