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research
Moisture resistance of SU-8 and KMPR as structural material for integrated gaseous detectors
Authors
V.M. Blanco Carballo
J. Melai
C. Salm
J. Schmitz
Publication date
1 January 2008
Publisher
Technology Foundation STW
Abstract
This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after one day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application. © 2008 Elsevier Science. All rights reserved
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Last time updated on 14/10/2017
University of Twente Research Information
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Last time updated on 12/07/2023