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SEM analysis of Particles and its effects in arc ion plating
Authors
吕反修
唐伟忠
+5 more
孙晓军
张勇
曹尔妍
李成明
李桂英
Publication date
25 June 2004
Publisher
Abstract
用扫描电镜对比分析了电弧离子镀增加直线磁场过滤对沉积TiN和TiAlN薄膜中颗粒的密度和尺寸的影响,,结果表明,TIN薄膜中颗粒的最大直径,从14μm减小到3μm,颗粒密度从lO~9/cm~2。降低到10~5/cm~2.TilN薄膜由于靶材中含有低熔点金属Al,因而发射出更大的颗粒,有的颗粒集团达到20μm,磁场过滤后颗粒尺寸减小,颗粒密度降低到10~6/cm~2。分析了脉冲叠加直流偏压对TiCrZrN复合薄膜相组成的影响。颗粒可使电弧离子镀rriN/crN多层膜的结合力降低,并使针孔产生遗传。使用直线型磁场过滤及脉冲叠加直流偏压不仅使颗粒密度和尺寸显著降低和减小,而且多层化对小颗粒产生了包覆作用
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Institute Of Mechanics,Chinese Academy of Sciences
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Last time updated on 12/02/2018