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High mobility bottom gate microcrystalline silicon TFT deposited by VHF PECVD
Authors
B Ballif
G Choong
M Python
N Wyrsch
Publication date
24 January 2010
Publisher
Palaiseau, France
Abstract
Abstract is not available.
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Infoscience - École polytechnique fédérale de Lausanne
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oai:infoscience.tind.io:143787
Last time updated on 09/02/2018