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偏压对Cr-DLC 纳米复合薄膜表面形貌和结构的影响
Authors
代伟
吴国松
汪爱英
Publication date
1 January 2009
Publisher
Abstract
采用线性离子束混合磁控溅射技术制备Cr-DLC纳米复合薄膜,并研究了衬底负偏压对薄膜表面结构和性能的影响。薄膜的成分和结构分别利用EDX和XRD进行表征;薄膜经稀硫酸腐蚀前后表面形貌采用荧光显微镜和原子力显微镜进行了分析;同时,利用接触角测试仪和电化学阻抗对薄膜的亲水性和电化学进行了研究。结果表明:薄膜结构为无定形态,含有少量Cr元素。在零偏压(接地)条件下所制备的Cr-DLC膜,掺入的Cr金属团簇或Cr/C化合物部分镶嵌在无定形碳膜中,暴露在薄膜表面外。经稀硫酸腐蚀后,形成"凹坑"和"针孔"。表面粗糙度变大,接触角(亲水性)变小。电化学腐蚀表现出很强的纯阻抗性;而在偏压条件下制备的薄膜,在稀硫酸腐蚀前后,表面形貌没有明显的变化。同时,薄膜腐蚀前后接触角变化不大,表现出良好的抗电化学腐蚀性能。偏压对Cr-DLC纳米复合薄膜表面形貌的影响可能与DLC膜"亚表面植入"生长模式和薄膜自溅射有关
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Last time updated on 22/01/2018