Large area plasma-enhanced chemical vapor deposition of nanocrystalline graphite on insulator for electronic device application

Abstract

This paper reports on large area plasma-enhanced chemical vapor deposition (PECVD) of nanocrystalline graphite (NCG) on thermally grown SiO2 wafer, quartz and sapphire substrates. Grown films are evaluated using Raman spectroscopy, ellipsometry, scanning electron microscopy (SEM) and atomic force microscopy (AFM). Electrical characterization and optical transmission measurementsindicate promising properties of this material for use as transparent electrodes and for electronic device application. A plasma-based etch process for NCG has been developed