Gier, Andreas

Mennig, Martin

Oliveira, Peter William de

Schmidt, Helmut K.

Acronym

Proceedings of the 3rd-iccg  571 Large area holographic surface relief micropatterns by embossing of thixotropic nanocomposite layers on plastic substrates  M. Mennig*, A. Gier, P.W. Oliveira, H. Schmidt, Institut für Neue Materialien, Im Stadtwald 43, 66123 Saarbrücken, Germany,    A new embossing technique for the fabrication of holographic surface relief micropatterns on plastic substrates has been developed. For state-of-the art embossing techniques with UV curable polymers or ormocers, the curing step has to be performed under the stamper or embossing roll. This leads to rather long processing times and restrictions to fast curing materials like methacrylates. This general drawback could be overcome by embossing of nanocomposite layers with thixotropic behaviour. In these layers, the viscosity decreases with increasing shear rate (imprinting step) and decreases again with degreasing shear rate (removing of the stamper or embossing roll). This allows to perform the UV curing after the removal of the embossing tool.  This new principle for micropatterning is demonstrated with organic-inorganic nanocomposite (Nanomer) layers, prepared from methacrylsilane (MPTS), fluorosilane and ZrO2 nanoparticles in MPTS : ZrO2 ratios between 10:1 and 1:2. Wet films of 15 µm in thickness have been prepared by doctor blade coating. After drying at 80°C for 3 minutes, holographic and CD-ROM like pitch patterns have been embossed using an embossing roll of 24 cm in diameter and 35 cm in width with a patterned Ni foil using embossing speeds between 1 m/min and 30 m/min and a final UV curing with about 100 W/cm2 for 30 s. By this method, picture holographic patterns with structural depths of up to 350 nm have been prepared on areas of 180 mm x 300 mm and CD-ROM-like pitch patterns with depths of 140 nm have been generated on areas with 120 mm diameter. The rheology of the dried gel layers, the refractive index and the UV-curing behaviour of the Nanomer material are discussed as a function of the size and concentration of the ZrO2 nanoparticles. This new technique offers very interesting prospects to cut down the processing time of CD-ROM-patterns, prepared by injection moulding by more than 1 order of magnitude.                                                           * corresponding author tel. (+49) (0)681/9300-394, fax(+49) (0)681/9300-223, email: mennig@inm-gmbh.de  

Large area holograpic surface relief micropatterns by embossing of thixotropic nanocomposite layers on plastic substrates

Scientific documents from the Saarland University,

Proceedings of the 3rd-iccg 
 
571 
Large area holographic surface relief micropatterns by embossing 
of thixotropic nanocomposite layers on plastic substrates 
 
M. Mennig*, A. Gier, P.W. Oliveira, H. Schmidt, 
Institut für Neue Materialien, Im Stadtwald 43, 66123 Saarbrücken, Germany,  
 
 
A new embossing technique for the fabrication of holographic surface relief micropatterns 
on plastic substrates has been developed. For state-of-the art embossing techniques with 
UV curable polymers or ormocers, the curing step has to be performed under the stamper 
or embossing roll. This leads to rather long processing times and restrictions to fast curing 
materials like methacrylates. This general drawback could be overcome by embossing of 
nanocomposite layers with thixotropic behaviour. In these layers, the viscosity decreases 
with increasing shear rate (imprinting step) and decreases again with degreasing shear rate 
(removing of the stamper or embossing roll). This allows to perform the UV curing after 
the removal of the embossing tool.  
This new principle for micropatterning is demonstrated with organic-inorganic 
nanocomposite (Nanomer) layers, prepared from methacrylsilane (MPTS), fluorosilane and 
ZrO2 nanoparticles in MPTS : ZrO2 ratios between 10:1 and 1:2. Wet films of 15 µm in 
thickness have been prepared by doctor blade coating. After drying at 80°C for 3 minutes, 
holographic and CD-ROM like pitch patterns have been embossed using an embossing roll 
of 24 cm in diameter and 35 cm in width with a patterned Ni foil using embossing speeds 
between 1 m/min and 30 m/min and a final UV curing with about 100 W/cm2 for 30 s. 
By this method, picture holographic patterns with structural depths of up to 350 nm have 
been prepared on areas of 180 mm x 300 mm and CD-ROM-like pitch patterns with depths 
of 140 nm have been generated on areas with 120 mm diameter. 
The rheology of the dried gel layers, the refractive index and the UV-curing behaviour of 
the Nanomer material are discussed as a function of the size and concentration of the ZrO2 
nanoparticles. 
This new technique offers very interesting prospects to cut down the processing time of 
CD-ROM-patterns, prepared by injection moulding by more than 1 order of magnitude. 
                                                          
* corresponding author 
tel. (+49) (0)681/9300-394, fax(+49) (0)681/9300-223, email: mennig@inm-gmbh.de 
 


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http://scidok.sulb.uni-saarland.de/volltexte/2010/2985/pdf/sm200004.pdf

Large area holograpic surface relief micropatterns by embossing of thixotropic nanocomposite layers on plastic substrates

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Scientific documents from the Saarland University,

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