A method for the asymmetric focusing of electron bunches, based on the active
plasma lensing technique is proposed. This method takes advantage of the strong
inhomogeneous magnetic field generated inside the capillary discharge plasma to
focus the ultrarelativistic electrons. The plasma and magnetic field parameters
inside the capillary discharge are described theoretically and modeled with
dissipative magnetohydrodynamic computer simulations enabling analysis of the
capillaries of rectangle cross-sections. Large aspect ratio rectangular
capillaries might be used to transport electron beams with high emittance
asymmetries, as well as assist in forming spatially flat electron bunches for
final focusing before the interaction point.Comment: 16 pages, 7 figures, 1 tabl