Status of ultratrace chemical analyses of materials for semiconductors was studied. This study covered atomic absorption spectroscopy, emission spectroscopy, and activation analyses. It makes recommendations to improve sensitivity, reliability and versatility for ultratrace chemical analysis

Dilts, R. V.

Hall, L. C.

English

NASA Technical Reports Server

May 1967	 Brief 67-10138 
NASA TECH BRIEF 
NASA Tech Briefs are issued to summarize specific innovations derived from the U.S. space program, 
to encourage their commercial application. Copies are available to the public at 15 cents each 
from the Clearinghouse for Federal- Scientific and Technical-Information, Springfield, Virginia 22151. 
Status of Ultrachemical Analysis for Semiconductors 
The range of topics which have a pertinency to 
ultrachemical analysis for semiconductor materials is 
fantastic. It embraces major portions of physics and 
chemistry and research has been reported recently 
ranging from wet-chemical determination of stoichi-
ometry for selenides and tellurides to electrical meas-
urements for pure materials. 
As a consequence, a project was initiated to deter-
mine the status of ultratrace chemical analyses of 
materials of interest to the field of semiconductors. 
Three areas were selected for a more intensified 
study and the results of this study are contained in: 
"The Status of Ultrachemical Analysis for Semicon-
ductors," by Robert V. Dilts and Larry C. Hall, Final 
Report, Vanderbilt University, December 15, 1966. 
Part I, Atomic Absorption Spectroscopy, is the 
method of choice for the bulk analysis of metal ions 
present in the parts per million (ppm) range, or less, 
in solutions. Over 60 different metals are capable of 
determination by this technique, with detection limits 
and sensitivities that are, in general, excellent. Forty-
eight elements can be detected at a level of one ppm 
or less and 17 more can be detected at concentrations 
above one ppm in solution. 
Part II, Emission Spectroscopy has long been used 
as a method for the determination of small amounts of 
elements in a wide variety of materials. The method is 
capable of determining impurities down to the trace,
parts per million, range routinely and with favorable 
circumstances down to the ultratrace, parts per billion, 
level. 
Part III, Activation Analyses are concerned with the 
methods of inducing nuclear transformations by 
subjecting nuclei to neutrons, protons, deuterons, 
alpha particles, and He 3
 ions. At present, neutron 
activation is viewed as the most general, sensitive 
method for elemental detection. It serves as a com-
parison for other trace and ultratrace methods. 
The report also makes recommendations that 
should offer profitable areas to improve sensitivity, 
reliability and versatility for ultratrace chemical anal-
yses. 
Note: 
Copies of this report are available from: 
Technology Utilization Officer 
Marshall Space Flight Center 
Huntsville, Alabama 35812 
Reference: B67-10138 
Patent status: 
No patent action is contemplated by NASA. 
Source: R. V. Dilts and L. C. Hall 
of Vanderbilt University 
under contract to 
Marshall Space Flight Center 
(M-FS-2254) 
Category 03 
This document was prepared under the sponsorship of the National 
Aeronautics and Space Administration. Neither the United States 
Government nor any person acting on behalf of the United States
Government assumes any liability resulting from the use of the 
information contained in this document, or warrants that such use 
will be free from privately owned rights.
https://ntrs.nasa.gov/search.jsp?R=19670000138 2020-03-11T20:49:24+00:00Z


Status of ultrachemical analysis for semiconductors

Atomic absorption and emission spectroscopy, and neutron activation for ultratrace chemical analysis of materials for semiconducto

Status of ultrachemical analysis for semiconductors

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