Self-supported aluminum thin film is produced by vacuum depositing the film on a polyvinyl formal resin film and then removing the resin by radiant heating in the vacuum. The aluminum film can be used as soon as the resin is eliminated

Neff, J. E.

Timme, R. W.

English

NASA Technical Reports Server

September 1966
	
Brief 66-10387 
NASA TECH BRIEF 
NASA Tech Briefs are issued to summarize specific innovations derived from the U. S. space 
program and to encourage their commercial application. Copies are available to the public from 
the Clearinghouse for Federal Scientific and Technical Information, Springfield, Virginia 22151. 
Self-Supported Aluminum Thin Films Produced

by Vacuum Deposition Process 
The problem: 
To devise a method of producing self-supported, 
highly pure aluminum thin films for use in experi-
mental studies involving reflection, transmission, and 
scattering of ultraviolet radiation, alpha particles, 
and beta particles. In conventional methods, the 
film is deposited on a substrate in one vacuum cham-
ber and the resultant combination is transferred 
through the air to another vacuum chamber contain-
ing the apparatus used in the studies. Both the sub-
strate and an oxide layer produced on the aluminum 
film by the air can interfere with these studies. 
The solution: 
Vacuum deposit the aluminum film on a polyvinyl 
formal resin film and then remove the resin by radiant 
heating in the vacuum. Self-supporting aluminum 
films as thin as 150 angstroms and having a diameter 
of 1 centimeter were produced in this manner. The 
aluminum films can be used as soon as the resin is 
eliminated. 
How it's done: 
The resin substrate is prepared by placing one drop 
of a 1-percent solution of polyvinyl formal in ethylene 
dichloride on the surface of cold water. The solvent 
evaporates in a few seconds, leaving a thin film of the 
resin on the water surface. This film is floated off the
water and mounted over a hole in a plate, which is 
then placed in a vacuum chamber containing the 
aluminum to be vacuum deposited as a film on the 
resin substrate. The resin is then decomposed by 
radiant heating in the vacuum at approximately 
250°C, leaving a self-supported thin aluminum film 
(which melts at approximately 660 0 C). When this 
procedure is carried out in the vacuum chamber con-
taining the test apparatus, the aluminum film may 
be used in the same vacuum in which it was produced. 
Notes: 
1. The aluminum film will be capable of self-support 
at a minimum thickness of approximately 150 
angstroms. 
2. It is anticipated that self-supporting thin films of 
other metals can be produced by this method. 
3. Inquiries concerning this innovation may be di-
rected to: 
Technology Utilization Officer 
Ames Research Center 
Moffett Field, California 94035 
Reference: B66-10387 
Patent status: 
No patent action is contemplated by NASA. 
Source: Robert W. Timme and John E. Neff 
(ARC-58) 
Category 03 
This document was prepared under the sponsorship of the National 
Aeronautics and Space Administration. Neither the United States 
Government nor any person acting on behalf of the United States
Government assumes any liability resulting from the use of the 
information contained in this document, or warrants that such use 
will be free from privately owned rights.
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Self-supported aluminum thin films produced by vacuum deposition process

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