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DEVELOPMENT OF PHOTOELECTRON-ASSISTED CHEMICAL VAPOR DEPOSITION

Abstract

We developed a photoelectron-assisted chemical vapor deposition (PACVD) that can deposit an ultra-thin perfluoropolyether (PFPE) film on a diamond-like carbon (DLC) surface. The DLC surface with a 1 nm-thick PFPE film deposited by the P ACVD showed a low surface energy. The surface also showed a low adhesion force that was caused by the low surface energy. We confirmed that the PFPE/DLC surface deposited by the PACVD has the potential to improve the areal density of hard disk drives.This work was supported in part by Kansai University, Outlay Support for Establishing Research Centers in 2014, a Kansai University Grant in Aid for the Promotion and Upgrading of Education and Research, and MEXT KAKENHI grant number 15H02216

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