CORE
🇺🇦
make metadata, not war
Services
Services overview
Explore all CORE services
Access to raw data
API
Dataset
FastSync
Content discovery
Recommender
Discovery
OAI identifiers
OAI Resolver
Managing content
Dashboard
Bespoke contracts
Consultancy services
Support us
Support us
Membership
Sponsorship
Community governance
Advisory Board
Board of supporters
Research network
About
About us
Our mission
Team
Blog
FAQs
Contact us
Si被注入Gd后的磁性及其整流特性的研究
Authors
刘志凯
周剑平
+5 more
宋书林
杨少延
林兰英
柴春林
陈诺夫
Publication date
1 January 2003
Publisher
Abstract
采用离子束技术,在n型硅基片中注入稀土元素钆,制备了磁性-非磁性p-n结.磁性层Gd_xSi_(1-x)表现出优良的磁学性能,高居里温度,高原子磁矩(利用RKKY模型可以得到解释),低矫顽力,并保持着半导体的属性,磁性-非磁性p-n结具有整流特性,但没有观察到明显的磁电阻效应
Similar works
Full text
Available Versions
Knowledge Repository of SEMI,CAS
See this paper in CORE
Go to the repository landing page
Download from data provider
oai:ir.semi.ac.cn:172111/17585
Last time updated on 15/03/2019