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掺杂和热处理对纳ZnO薄膜气敏特性影响
Authors
宋淑芳
李健
李海兰
田野
Publication date
1 January 2002
Publisher
Abstract
用真空蒸发法在玻璃和单晶硅片上制备纯Zn和掺杂Zn薄膜,然后在高于450 ℃条件下进行氧化、热处理(玻璃衬底)获得良好的纳米ZnO薄膜和掺杂ZnO薄膜。对单晶硅衬底上制备的纯Zn薄膜在高于800 ℃温度条件下进行液态源掺杂,获得掺B和P纳米ZnO薄膜。实验表明,掺杂和热处理使纳米ZnO薄膜的结构、导电性能得到改善,有效地降低了纳米ZnO薄膜的电阻,同时薄膜的气敏特性也得到较大的改善
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Last time updated on 15/03/2019