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在解复用模块设计中有效折射率变化的研究
Authors
刘育梁
李芳
+4 more
田珂珂
贺月娇
辛红丽
邱海军
Publication date
1 January 2003
Publisher
Abstract
研究了基于SOI(silicon-on-insulator)材料的阵列波导光栅(AWG)分波器件,给出了此器件材料色散的数值拟合公式,进而利用BPM方法研究了材料色散脊型波导结构变化和器件制做中刻蚀深度误差对波导有效折射率和波分复用模块性能的影响。结果表明,刻蚀深度误差对模块性能优劣起关键作用
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Last time updated on 15/03/2019