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research
Barrier-free subsurface incorporation of 3d metal atoms into Bi(111) films
Authors
U. Gerstmann
Michael Horn-von Hoegen
+9 more
G. Jnawali
C. Klein
Daniel Lükermann
Herbert Pfnür
W.G. Schmidt
P. Sutter
Christoph Tegenkamp
N.J. Vollmers
P. Zahl
Publication date
1 January 2015
Publisher
College Park, MD : American Physical Society
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Abstract
By combining scanning tunneling microscopy with density functional theory it is shown that the Bi(111) surface provides a well-defined incorporation site in the first bilayer that traps highly coordinating atoms such as transition metals (TMs) or noble metals. All deposited atoms assume exactly the same specific sevenfold coordinated subsurface interstitial site while the surface topography remains nearly unchanged. Notably, 3d TMs show a barrier-free incorporation. The observed surface modification by barrier-free subsorption helps to suppress aggregation in clusters. It allows a tuning of the electronic properties not only for the pure Bi(111) surface, but may also be observed for topological insulators formed by substrate-stabilized Bi bilayers. © 2015 American Physical Society.DFG/SFB/616DFG/SPP/1601DFG/Pf238/3
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Institutionelles Repositorium der Leibniz Universität Hannover
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Last time updated on 21/11/2017