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In-situ stripping of native SiO2 for Area Selective Deposition (ASD) of TiN during Plasma Atomic Layer Deposition (PEALD)
Authors
Samia Belahcen
Marceline Bonvalot
+6 more
Rémi Gassilloud
Moustapha Jaffal
Gauthier Lefèvre
Vincent Pesce
Christophe Vallée
Taguhi Yeghoyan
Publication date
1 November 2019
Publisher
HAL CCSD
Abstract
International audienc
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HAL-CEA
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oai:HAL:hal-03449213v1
Last time updated on 27/12/2021
Hal - Université Grenoble Alpes
See this paper in CORE
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oai:HAL:hal-03449213v1
Last time updated on 03/12/2021