We discuss the lift-off of free-standing epitaxially grown silicon layers from the porous silicon (PSI) process, which is a kerfless wafering technology. The lift-off is a crucial step in the PSI cycle. A high-porosity layer serves as a mechanically weak layer for lift-off and consists of widely spaced silicon bridges with thicknesses of 40-100 nm. The low width leads to a 33-fold stress enhancement in the bridges, making them break when a force is applied while the epitaxial layer and the substrate remain intact. We perform the free-standing lift-off with a curved vacuum chuck. A vacuum pressure of 0.2 bar is sufficient for controlled peeling off of the 30-50 um thick silicon layers. We simulate the stresses and the displacements of the epitaxial layer in the lift-off process close to the first non-broken bridge. We demonstrate the defect-free lift-off of 8 of 9 of 9 × 9 cm2 layers from 6" substrates.Renewable Energy Corporatio

Brendel, Rolf

Hensen, Jan

Kajari-Schröder, Sarah

Käsewieter, Jörg

AbstractWe discuss the lift-off of free-standing epitaxially grown silicon layers from the porous silicon (PSI) process, which is a kerfless wafering technology. The lift-off is a crucial step in the PSI cycle. A high-porosity layer serves as a mechanically weak layer for lift-off and consists of widely spaced silicon bridges with thicknesses of 40-100nm. The low width leads to a 33-fold stress enhancement in the bridges, making them break when a force is applied while the epitaxial layer and the substrate remain intact. We perform the free-standing lift-off with a curved vacuum chuck. A vacuum pressure of 0.2bar is sufficient for controlled peeling off of the 30-50μm thick silicon layers. We simulate the stresses and the displacements of the epitaxial layer in the lift-off process close to the first non-broken bridge. We demonstrate the defect-free lift-off of 8 of 9 of 9 x 9cm2 layers from 6” substrates

Elsevier - Publisher Connector 

 Energy Procedia  38 ( 2013 )  919 – 925 
1876-6102 © 2013 The Authors. Published by Elsevier Ltd.
Selection and/or peer-review under responsibility of the scientifi c committee of the SiliconPV 2013 conference
doi: 10.1016/j.egypro.2013.07.365 
ScienceDirect
SiliconPV: March 25-27, 2013, Hamelin, Germany
Lift-off of free-standing layers in the kerfless porous silicon
process
Sarah Kajari-Schrödera,*, Jörg Käsewietera, Jan Hensena, Rolf Brendela,b
aInstitute for Solar Energy Research Hamelin, D-31860 Emmerthal, Germany
bInstitute of Solid-State Physics, Leibniz Universität Hannover, D-30167 Hannover, Germany
Abstract
We discuss the lift-off of free-standing epitaxially grown silicon layers from the porous silicon (PSI) process, which 
is a kerfless wafering technology. The lift-off is a crucial step in the PSI cycle. A high-porosity layer serves as a 
mechanically weak layer for lift-off and consists of widely spaced silicon bridges with thicknesses of 40-100 nm. The 
low width leads to a 33-fold stress enhancement in the bridges, making them break when a force is applied while the
epitaxial layer and the substrate remain intact. We perform the free-standing lift-off with a curved vacuum chuck. A 
vacuum pressure of 0.2 bar is sufficient for controlled peeling off of the 30-50 μm thick silicon layers. We simulate
the stresses and the displacements of the epitaxial layer in the lift-off process close to the first non-broken bridge. We 
demonstrate the defect-free lift-off of 8 of 9 of 9 x 9 cm2
© 2013 The Authors. Published by Elsevier Ltd.
Selection and/or peer-review under responsibility of the scientific committee of the SiliconPV 2013
conference
Keywords: Porous silicon; lift-off; layer transfer; kerfless wafering
1. Introduction
This is the reason for the wafer thickness and kerfloss reductions advocated in the international
technology roadmap PV by 2020 [1]. The porous silicon (PSI) process [2,3] is one of several kerfless
wafering techniques [4,5] promising to fulfill or even surpass these requirements. In this process a thick 
substrate is electrochemically porosified, forming a low porosity top layer and a high porosity buried
layer. At high temperature of 1100°C the porous layer reorganizes and we epitaxially grow a silicon layer 
of thicknesses in the range of 30-50 μm. The reorganized buried high porosity layer is a mechanically 
weak breaking surface for the lift-off of the epitaxial layer, which serves as the absorber. The substrate re-
enters the PSI cycle and repeatedly serves as the growth substrate [6]. 
Available online at www.sciencedirect.com
© 2013 The Authors. Published by Elsevier Ltd.
Selection and/or peer-review under responsibility of the scientifi c committee of the SiliconPV 2013 conference
Open access under CC BY-NC-ND license. 
Open access under CC BY-NC-ND license. 
920   Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 
The lift-off process, which separates the epitaxial layer from the substrate, is a crucial step in the PSI 
process. The absorber layer needs to be defect-free after the lift-off. Defects can manifest in the form of 
cracks or torn-out pieces from the epitaxial layer. Additionally, no defects should be introduced into the 
substrate wafer that can limit the re-usability of the substrate wafer, e.g. chipping from the substrate 
wafer.  
There are two general options for a lift-off process: encapsulating the epitaxial layer before lift-off, 
thus mechanically supporting the layer, or free-standing lift-off. While we find encapsulated lift-off to be 
reliable and robust, lifting off free-standing PSI layers opens up further options for solar cell processing 
and eliminates the risk of contaminating the substrate with encapsulant. So far we have achieved the 
highest solar cell efficiencies on PSI layers with free-standing layers [8]. Therefore in this contribution we 
discuss a mechanical lift-off concept for free-standing PSI layers. 
2. Separation layer morphology 
Fig. 1 shows a scanning electron micrograph (SEM) image of a reorganized porous layer before and 
Fig. 2 after lift-off. The separation layer connects the substrate and the epitaxial layer by bridges that are 
typically 40-100 nm wide in the narrowest point. The thickness of the separation layer is about 200 nm. 
The typical distance of the bridges varies with the etching parameters and is in the range of 200-1000 nm 
in the depicted case. Therefore the cumulative cross sectional area of the narrowest points of the bridges 
is only about 3 % of the total substrate area. 
 
  
Fig. 1. SEM image of the porous silicon layer after epitaxial 
deposition. The substrate is at the bottom of the image, the 
epitaxial layer on top 
Fig. 2. Tilted SEM image of the separation layer on the 
substrate after lift-off.  
3. Free-standing lift-off 
3.1. Concept 
For lift-off the bridges of the separation layer have to break, while the whole of the epitaxial layer and 
the substrate need to stay intact. A force  applied perpendicular to the surface of the substrate is focused 
in the thin bridges of the separation layer. With a relative cross sectional area   of the bridges of 3 
 Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 921
% the stress in the bridges is enhanced by a factor of about 
with respect to the stress in the epitaxial layer. A typical silicon wafer 
breaks at stresses in the order of 300 MPa [7]. On an area of 12.5 x 12.5 cm2 this corresponds to a lift-off 
force of . We expect that the silicon bridges in the separation layer have an even higher 
breakage stress due to their thermally reorganized structure. The magnitude of the perpendicular lift-off 
forces for the full area is therefore too high even for the thin silicon bridges to make such a process
feasible.
In order to reduce the forces necessary for lift-off we use a setup that breaks the bridges consecutively
by peeling off the layer instead of forcing a simultaneous breakage of the bridges. Fig. 3 sketches our 
concept for the mechanical lift-off of free-standing PSI layers. We apply vacuum of about 0.2 bar through
a chuck with a curvature radius of 0.75 m. The chuck surface is in contact with the PSI layer and is slowly
rolled over the epitaxial layer. A related concept was presented in [9].
Fig. 3. Lift-off concept for free-standing PSI layers. A vacuum chuck 
is moved in a rolling motion across the epitaxial layer.
Fig. 4. Photographic image of the tool during lift-off. The
direction of motion corresponds to the sketch in Fig. 3.
3.2. Numerical model
For an appropriate design of the lift-off tool it is necessary to mechanically understand free-standing
lift-off process. In particular we are interested in how the required force for lift-off varies with the
progress of the lift-off process. Insight into this offers the potential to optimize the pressure distribution in
the chuck for efficient lift-off. As a first step towards this we therefore perform 3-dimensional mechanical
finite element method (FEM) simulations with COMSOL Multiphysics of the setup sketched in Fig. 5.
Here a 30 μm epitaxial silicon layer is on top of a 200 nm thick separation layer, which consists of 
equally spaced bridges of 100 nm width. The low-porosity starting layer is approximated as bulk silicon.
The bridges have a rotational symmetry and are rounded so that no sharp points exist that would cause
numerical divergences. On the left the separation layers is already released, i.e. free of bridges, on a lift-
off distance of 0-30 μm. Underneath the separation layer is a silicon substrate of thickness 300 μm. We 
simulate one strip with a width of 1 μm of this setup, containing one line of bridges, and use periodic 
boundary conditions to account for extended samples. Due to the low curvature the individual bridges still
922   Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 
locally experience a force perpendicular to the substrate surface. Therefore we apply a uniform suction 
pressure of to the epitaxial layer, while the substrate is fixed.
Fig. 5. Schematic view of the simulated setup. A uniform force is
applied to the epi surface, the back of the substrate is fixed. The
separation layer is already lift-off on the left of the sample. The red
square denotes the zoom of Fig. 5.
Fig. 6. Zoom into the deformation calculated from a FEM
simulation of the situation sketched in Fig. 4. The 
deformation is scaled by a factor of for better 
visibility.
3.3. Variation of lift-off distance
Figure 6 shows a slice plot of the simulated deformation of the separation layer, scaled up by a factor 
of for better visibility. In this case the lift-off distance is 30 μm. The epitaxial layer in this part is
displaced farther than the part that is still attached despite the uniformly applied force. The lift-off part of 
the epitaxial layer acts as a lever. As a result the stress concentration in the first remaining bridge is
higher than in the other remaining bridges. This bridge will thus be broken next.
Figure 7 shows surface plots of the first principal stress with the lift-off distance 10 μm (top) and 30
μm (bottom) on the left of the images, respectively. The scaling is identical in both figures, thus directly
showing the higher stress intensity in the first remaining bridge on the left of the images in comparison 
with the further bridges on the right. Also, the stress enhancement in the first remaining bridge is higher 
the longer the lift-off length is, as depicted in Fig. 8.
In the limit of zero lift-off length, i.e. if the separation layer has bridges on both ends of the sample, the
stress intensity in the outermost bridges is not elevated in comparison to bridges in the center of the 
sample. As a consequence the initial lift-off point is particularly demanding with respect to the vacuum
pressure applied. Layers that are in principle well cleavable with the presented setup may still suffer from 
difficulties in the initial lift-off point. On the other hand, already a small initial lift-off in one corner 
facilitates the continued release of the remaining layer.
 Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 923
Fig. 7. Slice of the simulated separation layer with a lift-off distance of 20 μm (top) and 30 μm (bottom). The left-most bridge is the 
first bridge that is not yet broken. The color code depicts the magnitude of the first principal stress.
Fig. 8. Maximum of the first principal stress on the first remaining bridge in dependence on the lift-off length.
3.4. Experimental application
We apply the lift-
round substrates with a non-etched rim of about 1 cm. We define the area for lift-off by laser scribing a 9
x 9cm2 square into the PSI layer. We mask the vacuum chuck with adhesive foil with a central cut out 
924   Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 
area of 9.5 x 9.5cm2, within this square the vacuum pressure is applied to the epitaxial layer. We align the
laser scribed area such that the lift-off starts at a corner and proceeds diagonally with respect to the
square, see Fig. 9. This reduces the required forces for the initial lift-off by limiting the width of 
simultaneous lift-off. However, this setup implies that the vacuum pressure may not be reduced as
strongly with the lift-off distance as suggested by Fig. 8, as the length of the lift-off front grows in the
first half of the process. We apply the lift-off process to 9 PSI layers that are etched with the same
parameters. 8 of 9 layers detach without a visible defect such as cracks in the PSI layer. Fig. 10 shows a
photograph of a PSI layer lifted-off with the described method. Due to the low thickness of 30 μm the
layer is highly flexible.
Fig. 9: Sketch of the sample orientation during lift-off. Fig. 10: Photograph of a 30 μm thick 9x9cm2 large 
PSI layer.
4. Conclusions
The lift-off concept discussed in this contribution utilizes a scheme of subsequent breakage of the
separation layer bridges. This reduces the forces required for lift-off drastically, as only a line of bridges
at the fracture front breaks simultaneously. The longer the lift-off length is in the process, the more the
stresses are focused specifically in the first remaining bridge. As a result, the actual challenge in operating
this tool is to achieve initial lift-off, while requirements for continued lift-off are much lower. We have
applied this lift-off concept on epitaxial layers which were laser scribed to 9x9 cm2
realize a crack-free lift-off yield of 8 of 9 layers.
In the industrialization of the PSI process, the lift-off process, freestanding or supported, is crucial.
Without defect-free lift-off yield in the high 90 % range the cost reduction potential cannot be exploited. 
Even worse than a damaged PSI layer is a damaged substrate, as it is used repeatedly in the PSI cycle.
However, with the lift-off concept discussed in this contribution we demonstrated the feasibility of free-
standing lift-off. This now enables a range of solar cell processes that would not be possible in a lift-off 
scheme where the PSI layer is permanently attached to a carrier, e.g. further high temperature steps after 
lift-off. 
Acknowledgements
The authors thank Renate Winter for sample preparation and Johannes Aprojanz for performing
simulations. We gratefully acknowledge financial support by the Renewable Energy Corporation.
 Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 925
References 
[1] International Technology Roadmap for Photovoltaic (ITRPV.net) Results 2011, March 2012 full edition. Retrieved 
19.11.2012 
[2] H. Tayanaka and T. Matsushita, Separation of thin epitaxial Si film on porous Si for solar cells, in Proceedings of the 6th 
Sony Research Forum, 1996,  pp. 556 
C, 
Barcelona, Spain, 1997, pp. 1354 1357, 
[4] F. Dross, A. Milhe, J. Robbelein, I. Gordon, P.-O -Cut: A kerf-loss-free 
method for wafering 50-μm-thick crystalline Si wafers based on stress-induced lift- rd EU PVSEC, 
Valencia, (WIP, Munich; 2008), p. 1278-1281 
[5] F. Henley, A. Lam -
Proceedings of the 23rd EU PVSEC, Valencia, (WIP, Munich; 2008), p. 1090-1093 
[6] V. Steckenreiter, J. Hensen, A. Knorr, E. Garralaga Rojas, S. Kajari-Schr
substrates for manifold re- -22, Hangzhou, 2012 
[7] J. H. Petermann, D. Zielke, J. Schmidt, F. Haase, E. G. Rojas, and R. Brendel, 19%-efficient -thick crystalline si 
solar cell from layer transfer using porous silicon, Progress in Photovoltaics 20, 1-5,  (2011). 
[8
w -2077. 
[9 -film single-crystal device, solar cell module and method of producing the 
 


Lift-off of Free-standing Layers in the Kerfless Porous Silicon Process 

Institutionelles Repositorium der Leibniz Universität Hannover

 Energy Procedia  38 ( 2013 )  919 – 925 1876-6102 © 2013 The Authors. Published by Elsevier Ltd.Selection and/or peer-review under responsibility of the scientifi c committee of the SiliconPV 2013 conferencedoi: 10.1016/j.egypro.2013.07.365 ScienceDirectSiliconPV: March 25-27, 2013, Hamelin, GermanyLift-off of free-standing layers in the kerfless porous siliconprocessSarah Kajari-Schrödera,*, Jörg Käsewietera, Jan Hensena, Rolf Brendela,baInstitute for Solar Energy Research Hamelin, D-31860 Emmerthal, GermanybInstitute of Solid-State Physics, Leibniz Universität Hannover, D-30167 Hannover, GermanyAbstractWe discuss the lift-off of free-standing epitaxially grown silicon layers from the porous silicon (PSI) process, which is a kerfless wafering technology. The lift-off is a crucial step in the PSI cycle. A high-porosity layer serves as a mechanically weak layer for lift-off and consists of widely spaced silicon bridges with thicknesses of 40-100 nm. The low width leads to a 33-fold stress enhancement in the bridges, making them break when a force is applied while theepitaxial layer and the substrate remain intact. We perform the free-standing lift-off with a curved vacuum chuck. A vacuum pressure of 0.2 bar is sufficient for controlled peeling off of the 30-50 μm thick silicon layers. We simulatethe stresses and the displacements of the epitaxial layer in the lift-off process close to the first non-broken bridge. We demonstrate the defect-free lift-off of 8 of 9 of 9 x 9 cm2© 2013 The Authors. Published by Elsevier Ltd.Selection and/or peer-review under responsibility of the scientific committee of the SiliconPV 2013conferenceKeywords: Porous silicon; lift-off; layer transfer; kerfless wafering1. IntroductionThis is the reason for the wafer thickness and kerfloss reductions advocated in the internationaltechnology roadmap PV by 2020 [1]. The porous silicon (PSI) process [2,3] is one of several kerflesswafering techniques [4,5] promising to fulfill or even surpass these requirements. In this process a thick substrate is electrochemically porosified, forming a low porosity top layer and a high porosity buriedlayer. At high temperature of 1100°C the porous layer reorganizes and we epitaxially grow a silicon layer of thicknesses in the range of 30-50 μm. The reorganized buried high porosity layer is a mechanically weak breaking surface for the lift-off of the epitaxial layer, which serves as the absorber. The substrate re-enters the PSI cycle and repeatedly serves as the growth substrate [6]. Available online at www.sciencedirect.com© 2013 The Authors. Published by Elsevier Ltd.Selection and/or peer-review under responsibility of the scientifi c committee of the SiliconPV 2013 conferenceOpen access under CC BY-NC-ND license. Open access under CC BY-NC-ND license. 920   Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 The lift-off process, which separates the epitaxial layer from the substrate, is a crucial step in the PSI process. The absorber layer needs to be defect-free after the lift-off. Defects can manifest in the form of cracks or torn-out pieces from the epitaxial layer. Additionally, no defects should be introduced into the substrate wafer that can limit the re-usability of the substrate wafer, e.g. chipping from the substrate wafer.  There are two general options for a lift-off process: encapsulating the epitaxial layer before lift-off, thus mechanically supporting the layer, or free-standing lift-off. While we find encapsulated lift-off to be reliable and robust, lifting off free-standing PSI layers opens up further options for solar cell processing and eliminates the risk of contaminating the substrate with encapsulant. So far we have achieved the highest solar cell efficiencies on PSI layers with free-standing layers [8]. Therefore in this contribution we discuss a mechanical lift-off concept for free-standing PSI layers. 2. Separation layer morphology Fig. 1 shows a scanning electron micrograph (SEM) image of a reorganized porous layer before and Fig. 2 after lift-off. The separation layer connects the substrate and the epitaxial layer by bridges that are typically 40-100 nm wide in the narrowest point. The thickness of the separation layer is about 200 nm. The typical distance of the bridges varies with the etching parameters and is in the range of 200-1000 nm in the depicted case. Therefore the cumulative cross sectional area of the narrowest points of the bridges is only about 3 % of the total substrate area.    Fig. 1. SEM image of the porous silicon layer after epitaxial deposition. The substrate is at the bottom of the image, the epitaxial layer on top Fig. 2. Tilted SEM image of the separation layer on the substrate after lift-off.  3. Free-standing lift-off 3.1. Concept For lift-off the bridges of the separation layer have to break, while the whole of the epitaxial layer and the substrate need to stay intact. A force  applied perpendicular to the surface of the substrate is focused in the thin bridges of the separation layer. With a relative cross sectional area   of the bridges of 3  Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 921% the stress in the bridges is enhanced by a factor of about with respect to the stress in the epitaxial layer. A typical silicon wafer breaks at stresses in the order of 300 MPa [7]. On an area of 12.5 x 12.5 cm2 this corresponds to a lift-off force of . We expect that the silicon bridges in the separation layer have an even higher breakage stress due to their thermally reorganized structure. The magnitude of the perpendicular lift-off forces for the full area is therefore too high even for the thin silicon bridges to make such a processfeasible.In order to reduce the forces necessary for lift-off we use a setup that breaks the bridges consecutivelyby peeling off the layer instead of forcing a simultaneous breakage of the bridges. Fig. 3 sketches our concept for the mechanical lift-off of free-standing PSI layers. We apply vacuum of about 0.2 bar througha chuck with a curvature radius of 0.75 m. The chuck surface is in contact with the PSI layer and is slowlyrolled over the epitaxial layer. A related concept was presented in [9].Fig. 3. Lift-off concept for free-standing PSI layers. A vacuum chuck is moved in a rolling motion across the epitaxial layer.Fig. 4. Photographic image of the tool during lift-off. Thedirection of motion corresponds to the sketch in Fig. 3.3.2. Numerical modelFor an appropriate design of the lift-off tool it is necessary to mechanically understand free-standinglift-off process. In particular we are interested in how the required force for lift-off varies with theprogress of the lift-off process. Insight into this offers the potential to optimize the pressure distribution inthe chuck for efficient lift-off. As a first step towards this we therefore perform 3-dimensional mechanicalfinite element method (FEM) simulations with COMSOL Multiphysics of the setup sketched in Fig. 5.Here a 30 μm epitaxial silicon layer is on top of a 200 nm thick separation layer, which consists of equally spaced bridges of 100 nm width. The low-porosity starting layer is approximated as bulk silicon.The bridges have a rotational symmetry and are rounded so that no sharp points exist that would causenumerical divergences. On the left the separation layers is already released, i.e. free of bridges, on a lift-off distance of 0-30 μm. Underneath the separation layer is a silicon substrate of thickness 300 μm. We simulate one strip with a width of 1 μm of this setup, containing one line of bridges, and use periodic boundary conditions to account for extended samples. Due to the low curvature the individual bridges still922   Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 locally experience a force perpendicular to the substrate surface. Therefore we apply a uniform suction pressure of to the epitaxial layer, while the substrate is fixed.Fig. 5. Schematic view of the simulated setup. A uniform force isapplied to the epi surface, the back of the substrate is fixed. Theseparation layer is already lift-off on the left of the sample. The redsquare denotes the zoom of Fig. 5.Fig. 6. Zoom into the deformation calculated from a FEMsimulation of the situation sketched in Fig. 4. The deformation is scaled by a factor of for better visibility.3.3. Variation of lift-off distanceFigure 6 shows a slice plot of the simulated deformation of the separation layer, scaled up by a factor of for better visibility. In this case the lift-off distance is 30 μm. The epitaxial layer in this part isdisplaced farther than the part that is still attached despite the uniformly applied force. The lift-off part of the epitaxial layer acts as a lever. As a result the stress concentration in the first remaining bridge ishigher than in the other remaining bridges. This bridge will thus be broken next.Figure 7 shows surface plots of the first principal stress with the lift-off distance 10 μm (top) and 30μm (bottom) on the left of the images, respectively. The scaling is identical in both figures, thus directlyshowing the higher stress intensity in the first remaining bridge on the left of the images in comparison with the further bridges on the right. Also, the stress enhancement in the first remaining bridge is higher the longer the lift-off length is, as depicted in Fig. 8.In the limit of zero lift-off length, i.e. if the separation layer has bridges on both ends of the sample, thestress intensity in the outermost bridges is not elevated in comparison to bridges in the center of the sample. As a consequence the initial lift-off point is particularly demanding with respect to the vacuumpressure applied. Layers that are in principle well cleavable with the presented setup may still suffer from difficulties in the initial lift-off point. On the other hand, already a small initial lift-off in one corner facilitates the continued release of the remaining layer. Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 923Fig. 7. Slice of the simulated separation layer with a lift-off distance of 20 μm (top) and 30 μm (bottom). The left-most bridge is the first bridge that is not yet broken. The color code depicts the magnitude of the first principal stress.Fig. 8. Maximum of the first principal stress on the first remaining bridge in dependence on the lift-off length.3.4. Experimental applicationWe apply the lift-round substrates with a non-etched rim of about 1 cm. We define the area for lift-off by laser scribing a 9x 9cm2 square into the PSI layer. We mask the vacuum chuck with adhesive foil with a central cut out 924   Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 area of 9.5 x 9.5cm2, within this square the vacuum pressure is applied to the epitaxial layer. We align thelaser scribed area such that the lift-off starts at a corner and proceeds diagonally with respect to thesquare, see Fig. 9. This reduces the required forces for the initial lift-off by limiting the width of simultaneous lift-off. However, this setup implies that the vacuum pressure may not be reduced asstrongly with the lift-off distance as suggested by Fig. 8, as the length of the lift-off front grows in thefirst half of the process. We apply the lift-off process to 9 PSI layers that are etched with the sameparameters. 8 of 9 layers detach without a visible defect such as cracks in the PSI layer. Fig. 10 shows aphotograph of a PSI layer lifted-off with the described method. Due to the low thickness of 30 μm thelayer is highly flexible.Fig. 9: Sketch of the sample orientation during lift-off. Fig. 10: Photograph of a 30 μm thick 9x9cm2 large PSI layer.4. ConclusionsThe lift-off concept discussed in this contribution utilizes a scheme of subsequent breakage of theseparation layer bridges. This reduces the forces required for lift-off drastically, as only a line of bridgesat the fracture front breaks simultaneously. The longer the lift-off length is in the process, the more thestresses are focused specifically in the first remaining bridge. As a result, the actual challenge in operatingthis tool is to achieve initial lift-off, while requirements for continued lift-off are much lower. We haveapplied this lift-off concept on epitaxial layers which were laser scribed to 9x9 cm2realize a crack-free lift-off yield of 8 of 9 layers.In the industrialization of the PSI process, the lift-off process, freestanding or supported, is crucial.Without defect-free lift-off yield in the high 90 % range the cost reduction potential cannot be exploited. Even worse than a damaged PSI layer is a damaged substrate, as it is used repeatedly in the PSI cycle.However, with the lift-off concept discussed in this contribution we demonstrated the feasibility of free-standing lift-off. This now enables a range of solar cell processes that would not be possible in a lift-off scheme where the PSI layer is permanently attached to a carrier, e.g. further high temperature steps after lift-off. AcknowledgementsThe authors thank Renate Winter for sample preparation and Johannes Aprojanz for performingsimulations. We gratefully acknowledge financial support by the Renewable Energy Corporation. Sarah Kajari-Schröder et al. /  Energy Procedia  38 ( 2013 )  919 – 925 925References [1] International Technology Roadmap for Photovoltaic (ITRPV.net) Results 2011, March 2012 full edition. Retrieved 19.11.2012 [2] H. Tayanaka and T. Matsushita, Separation of thin epitaxial Si film on porous Si for solar cells, in Proceedings of the 6th Sony Research Forum, 1996,  pp. 556 C, Barcelona, Spain, 1997, pp. 1354 1357, [4] F. Dross, A. Milhe, J. Robbelein, I. Gordon, P.-O -Cut: A kerf-loss-free method for wafering 50-μm-thick crystalline Si wafers based on stress-induced lift- rd EU PVSEC, Valencia, (WIP, Munich; 2008), p. 1278-1281 [5] F. Henley, A. Lam -Proceedings of the 23rd EU PVSEC, Valencia, (WIP, Munich; 2008), p. 1090-1093 [6] V. Steckenreiter, J. Hensen, A. Knorr, E. Garralaga Rojas, S. Kajari-Schrsubstrates for manifold re- -22, Hangzhou, 2012 [7] J. H. Petermann, D. Zielke, J. Schmidt, F. Haase, E. G. Rojas, and R. Brendel, 19%-efficient -thick crystalline si solar cell from layer transfer using porous silicon, Progress in Photovoltaics 20, 1-5,  (2011). [8w -2077. [9 -film single-crystal device, solar cell module and method of producing the  

Lift-off of free-standing layers in the kerfless porous silicon process

Sarah Kajari-Schröder

Jörg Käsewieter

Jan Hensen

Rolf Brendel

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Lift-off of Free-standing Layers in the Kerfless Porous Silicon Process

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Lift-off of free-standing layers in the kerfless porous silicon process

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