We have measured both the current-voltage (ISD-VGS)
and capacitance-voltage (C-VGS) characteristics of a
MoS2−LiNbO3 field effect transistor. From the measured capacitance
we calculate the electron surface density and show that its gate voltage
dependence follows the theoretical prediction resulting from the
two-dimensional free electron model. This model allows us to fit the measured
ISD-VGS characteristics over the \emph{entire range} of
VGS. Combining this experimental result with the measured
current-voltage characteristics, we determine the field effect mobility as a
function of gate voltage. We show that for our device this improved combined
approach yields significantly smaller values (more than a factor of 4) of the
electron mobility than the conventional analysis of the current-voltage
characteristics only.Comment: to appear in Applied Physics Letter