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AFM and photoluminescence studies of swift heavy ion induced nanostructured aluminum oxide thin films
Authors
B.N. Lakshminarasappa
K.R. Nagabhushana
+3 more
K. Narasimha Rao
F. Singh
I. Sulania
Publication date
1 January 2008
Publisher
'Elsevier BV'
Doi
Cite
Abstract
E-beam evaporated aluminum oxide films were irradiated with 120 MeV swift Au9+ ions in order to induced nanostructure formation. Atomic force microscope (AFM) results showed the formation of nanostructures for films irradiated with a fluence of 1 à 1013 ions cm-2. The particle size estimated by section analysis of the irradiated film was in the range 25-30 nm. Glancing angle X-ray diffraction (GAXRD) revealed the amorphous nature of the films. Two strong Photoluminescence (PL) emission bands with peaks at â¼430 nm and â¼645 nm besides a shoulder at â¼540 nm were observed in all irradiated samples. The PL intensity is found to increase with increase of ion fluence. © 2008 Elsevier B.V. All rights reserved
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