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双源电子束蒸发提高光学薄膜致密性的工艺研究
Authors
吴旭明
周代兵
+3 more
王晓东
谭满清
赵妙
Publication date
1 January 2007
Publisher
Abstract
采用双源电子束蒸发的方法,在K9玻璃基片上蒸镀Si和SiO2得到的混合膜层,折射率不仅可调,而且比Si膜要高.用原子力显微镜(AFM)分别对单纯镀的Si膜与双源电子束蒸发镀的Si/SiO2混合膜层的表面形貌进行了观测,结果表明,前者表面疏松,有明显的孔洞结构;后者膜层表面细密.采用双源蒸发的成膜理论,对该方法提高膜层致密性的原因进行了探讨
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Last time updated on 29/11/2016