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双异质外延Si/Al_2O_3/Si薄膜制作的CMOS器件
Authors
于芳
刘忠立
+8 more
昝育德
李瑞云
林兰英
王俊
王占国
王建华
王玉田
韩秀峰
Publication date
1 January 2004
Publisher
Abstract
报道了利用高真空MOCVD外延生长γ氧化铝的技术和利用SOS CMOS的成熟工艺制作双异质外延Si/γ-Al2O3/Si单晶薄膜以及用其研制Si/γ-Al2O3/Si CMOS场效应晶体管、Si/γ-Al2O3/Si CMOS集成电路的初步结果
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Last time updated on 29/11/2016