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纳米晶Si在高压下的电学性质与金属化相变
Authors
何宇亮
柳翠霞
+3 more
王卫乡
陈伟
鲍忠兴
Publication date
1 January 1999
Publisher
Abstract
在金刚石压砧装置上,采用电阻和电容测量方法,研究了粒径为15~18nm和80nm的纳米晶Si在室温下、24GPa内的电阻、电容与压力的关系。实验结果表明,它们分别在19~17GPa和14GPa左右发生了金属化相变
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Last time updated on 29/11/2016