URL:http://link.aps.org/doi/10.1103/PhysRevB.54.17938
DOI:10.1103/PhysRevB.54.17938Kinetic roughening during homoepitaxial growth was studied for Ag(111) and Ag(001). For Ag(111), from 150 to 500 K, the rms roughness exhibits a power law, σ∝tβ over nearly three decades in thickness. β≈1/2 at low temperatures, and there is an abrupt transition to smaller values above 300 K. In contrast, Ag(001) exhibits layer-by-layer growth with a significantly smaller β. These results are the first to establish the evolution of surface roughness quantitatively for a broad thickness and temperature range, as well as for the case where growth kinetics are dominated by a step-ledge diffusion barrier.Support is acknowledged from the University of Missouri Research Board, the NSF under Contract Nos. DMR-9202528 and DMR-9623827, and the Midwest Superconductivity Consortium ~MISCON! under DOE Grant No. DE-FG02-90ER45427. The SUNY X3 beamline is supported by the DOE under Contract No. DE-FG02-86ER45231, and the NSLS is supported by the DOE, Div. of Materials Sciences and Div. of Chemical Sciences. One of us
~W.C.E.! acknowledges support from the GAANN program of the U.S. Department of Education. We thank Ian Robinson for the Ag~111! crystal
