In this study, a Mask Projection Micro-Stereolithography (MPµSLA) process with the
ability to cure a film of various thicknesses on transparent substrates is presented. Incident
radiation, patterned by a dynamic mask, passes through a transparent substrate to cure
photopolymer resin layers that grow progressively from the substrate surface. When compared
to existing Stereolithography techniques, this technique eliminates the necessity of recoating,
reducing process time and improving accuracy. A film of varying thicknesses can be fabricated
on flat or curved transparent substrates. Models of the optical system and resin cure are
developed and reported. An existing MPµSLA process planning method is being extended to
account for radiation transmission through a substrate. The models are verified using
experiments.Mechanical Engineerin
