Simonds, Brian J.

Spalding, Facutly Advisor, Gabriel C.

Digital Commons @ Illinois Wesleyan University

Illinois Wesleyan UniversityDigital Commons @ IWUJohn Wesley Powell Student ResearchConference 2004, 15th Annual JWP ConferenceApr 17th, 1:15 PM - 2:30 PMFabrication Techniques of Mesoscopic DevicesBrian J. SimondsIllinois Wesleyan UniversityGabriel C. Spalding, Facutly AdvisorIllinois Wesleyan UniversityFollow this and additional works at: http://digitalcommons.iwu.edu/jwprcThis Event is brought to you for free and open access by The Ames Library, the Andrew W. Mellon Center for Curricular and FacultyDevelopment, the Office of the Provost and the Office of the President. It has been accepted for inclusion in Digital Commons @ IWU bythe faculty at Illinois Wesleyan University. For more information, please contact digitalcommons@iwu.edu.©Copyright is owned by the author of this document.Brian J. Simonds and Gabriel C. Spalding, Facutly Advisor, "Fabrication Techniques of Mesoscopic Devices" (April 17,2004). John Wesley Powell Student Research Conference. Paper 22.http://digitalcommons.iwu.edu/jwprc/2004/posters2/22THE JOHN WESLEY POWELL STUDENT RESEARCH CONFERENCE - APRIL 2004 Poster Presentation P44 FABRICATION TECHNIQUES OF MESOSCOPIC DEVICES Brian J. Simonds and Gabriel C. Spalding* Department of Physics, Illinois Wesleyan University The meso scopic scale divides the regime of single atoms and molecules, where much is understood from quantum theory, from the regime of the optical microscope, where quantum "weirdness" is typically averaged away, in the collective, ensemble behavior of huge numbers of atoms and molecules. We seek the experimental means to span these length scales. Electron beam (e-beam) lithography is a fabrication process that uses a tightly focused beam of electrons to create patterns with features on the nanoscale. For this purpose, we are interfacing an external control to the beam of a scanning electron microscope (SEM), which is normally an imaging tool rather than a manufacturing tool. By connecting the scan coils of the microscope to a card providing programmable outputs, we can sweep the electron beam in predetermined patterns. These patterns can be used to "expose" an energy-sensitive layer that we spin-coat onto our samples (either silicon, for micromachining, or metal-coated silica, for the creation of diffractive optics or transparent nanofluidip devices). The wavelength of an electron accelerated through 30,000 Volts is .07 1 A, which implies that high spatial resolution can be achieved by working with such beams. In practice, resolution is determined both by scattering within the sample, and by the degree to which one can correct for aberrations in the electron optics of the SEM, which is the focus of our discussion. 

Fabrication Techniques of Mesoscopic Devices

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Fabrication Techniques of Mesoscopic Devices

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