Verfahren zur Herstellung eines Duennschichtsystems durch Puls-Magnetron-Sputtern

Abstract

DE 10327050 A UPAB: 20050126 NOVELTY - The method involves applying at least one individual layer (2) as sub-regions (2a-2c) lying one on the other in the growth direction so that the separation of such stacked sub-regions of the layer takes place with a different pulse mode and/or a different pulse ratio and/or a different number of individual pulses per pulse packet and/or different pulse duration. DETAILED DESCRIPTION - AN INDEPENDENT CLAIM is also included for the following: (1) a product consisting of a base body and a layer system applied in accordance with the inventive method. USE - For manufacturing a thin film system by pulse-magnetron sputtering. ADVANTAGE - Improved to achieve a very low degree of micro-roughness of the boundary surface between individual layers