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Influence of the oxidation temperature on the structure and the hardness of Cr2N-based films deposited by a hybrid magnetron sputtering-arc evaporation process
Authors
Alain Billard
J. Lintymer
+4Â more
Nicolas Martin
J. F. Pierson
V. Rachpech
J. Von Stebut
Publication date
28 May 2007
Publisher
HAL CCSD
Abstract
Abstract is not available.
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HAL - Université de Franche-Comté
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oai:HAL:hal-00346270v1
Last time updated on 12/11/2016
Hal-Diderot
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oai:HAL:hal-00346270v1
Last time updated on 11/05/2022
HAL Descartes
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oai:HAL:hal-00346270v1
Last time updated on 10/08/2022