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Low-cost automatic system for the control of the surface quality of coated and uncoated wafers
Authors
A. Joerg
M. Lequime
J. Lumeau
M. Zerrad
Publication date
16 June 2013
Publisher
HAL CCSD
Abstract
International audienceAn automatic system for the characterization of the surface quality of wafers is presented. It is based on the imaging of the surface defects scattered light. Detailed procedure and experimental data are presented
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oai:HAL:hal-00946576v1
Last time updated on 11/11/2016