CORE
🇺🇦
make metadata, not war
Services
Research
Services overview
Explore all CORE services
Access to raw data
API
Dataset
FastSync
Content discovery
Recommender
Discovery
OAI identifiers
OAI Resolver
Managing content
Dashboard
Bespoke contracts
Consultancy services
Support us
Support us
Membership
Sponsorship
Community governance
Advisory Board
Board of supporters
Research network
About
About us
Our mission
Team
Blog
FAQs
Contact us
Variations of hole mass in pMOSFETs under process induced stress
Authors
T. Guillaume M. Mouis
Publication date
1 January 2005
Publisher
'Lexxion Verlag'
Abstract
International audienc
Similar works
Full text
Available Versions
Hal - Université Grenoble Alpes
See this paper in CORE
Go to the repository landing page
Download from data provider
oai:HAL:hal-00146568v1
Last time updated on 11/11/2016