Feature models are used to specify variability of user-configurable systems
as appearing, e.g., in software product lines. Software product lines are
supposed to be long-living and, therefore, have to continuously evolve over
time to meet ever-changing requirements. Evolution imposes changes to feature
models in terms of edit operations. Ensuring consistency of concurrent edits
requires appropriate conflict detection techniques. However, recent approaches
fail to handle crucial subtleties of extended feature models, namely
constraints mixing feature-tree patterns with first-order logic formulas over
non-Boolean feature attributes with potentially infinite value domains. In this
paper, we propose a novel conflict detection approach based on symbolic graph
transformation to facilitate concurrent edits on extended feature models. We
describe extended feature models formally with symbolic graphs and edit
operations with symbolic graph transformation rules combining graph patterns
with first-order logic formulas. The approach is implemented by combining
eMoflon with an SMT solver, and evaluated with respect to applicability.Comment: In Proceedings FMSPLE 2016, arXiv:1603.0857
