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The Electrical Properties of In-situ Doped Polycrystalline Silicon Thin Films Grown by Electron Cyclotron Resonance Chemical Vapor Deposition at 250 ℃
Authors
H. L Hwang
R. Y. Wang
T. R. Yew
Y. L. Jiang
Publication date
6 June 2014
Publisher
Abstract
Abstract is not available.
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National Chung Hsing University Institutional Repository
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oai:ir.lib.nchu.edu.tw:11455/4...
Last time updated on 16/06/2016
