In this paper, we use the finite difference time-domain (FDTD) method to optimize the TE-polarized light transmission of a metal-semiconductor-metal photodetector (MSMPD) employing a dielectric waveguide on top of metal nano-gratings. Simulation results demonstrate that the funneling transmission of the TE-polarized light through the nanoslit of the structure is highly dependent on the structure geometries such as the waveguide and nano-grating heights. We also demonstrate that adding a dielectric waveguide layer on top of the nano-metal grating supports both the TM- and TE polarizations, and enhances the light transmission for TE-polarization approximately 3-times

Alameh, Kamal

Karar, Ayman

Lee, Yong

Nirmalathas, Ampalavanapillai

Tan, Chee Leong

English

Research Online @ ECU

Edith Cowan University Research Online ECU Publications 2012 1-1-2012 Metal-semiconductor-metal photodetector with enhanced TE-polarization transmission Ayman Karar Chee Leong Tan Kamal Alameh Edith Cowan University, k.alameh@ecu.edu.au Yong Lee Edith Cowan University Ampalavanapillai Nirmalathas Follow this and additional works at: https://ro.ecu.edu.au/ecuworks2012  Part of the Engineering Commons Karar, A. , Tan, C., Alameh, K. , Lee, Y. T., & Nirmalathas, A. (2012). Metal-semiconductor-metal photodetector with enhanced TE-polarization transmission. Proceedings of 6th International Symposium on Macro- and Supramolecular Architectures and Materials (MAM'12). (pp. 173 - 178). Tamil Nadu, India. Bloomsbury Publishing India Pvt. Ltd. This Conference Proceeding is posted at Research Online. https://ro.ecu.edu.au/ecuworks2012/142 Metal-Semiconductor-Metal Photodetector with Enhanced TE-Polarization Transmission 173  METAL-SEMICONDUCTOR-METAL PHOTODETECTOR WITH ENHANCED  TE-POLARIZATION TRANSMISSION AYMAN KARAR1*, CHEE LEONG TAN2, KAMAL ALAMEH1,4*,  YONG TAK LEE2,3,4 AND AMPALAVANAPILLAI NIRMALATHAS5 1Electron Science Research Institute, Edith Cowan University, AU 2School of Photonics Science, Gwangju Institute of Science and Technology (GIST),  Gwangju, Republic of Korea 3Department of Information and Communications, GIST, Republic of Korea 4Department of Nanobio Materials and Electronics, World Class University (WCU), GIST, Republic of Korea 5Department of Electrical and Electronic Engineering, The University of Melbourne, AU E-mail: akarar@ecu.edu.au; k.alameh@ecu.edu.au ABSTRACT In this paper, we use the finite difference time-domain (FDTD) method to optimize the TE-polarized light transmission of a metal-semiconductor-metal photodetector (MSM-PD) employing a dielectric waveguide on top of metal nano-gratings. Simulation results demonstrate that the funneling transmission of the TE-polarized light through the nanoslit of the structure is highly dependent on the structure geometries such as the waveguide and nano-grating heights. We also demonstrate that adding a dielectric waveguide layer on top of the nano-metal grating supports both the TM- and TE polarizations, and enhances the light transmission for TE-polarization approximately 3-times. INTRODUCTION Metal-semiconductor-metal photodetectors (MSM-PDs) have several attractive features, such as high speed, ease of fabrication and monolithic integration with VLSI circuitry, which make V. Rajendran, R. Yuvakkumar, K. Thyagarajah and K.E. Geckeler (eds.) Applications of Nano Materials: Electronics, Energy and Environment, pp. 173–178 (2012). © Bloomsbury Publishing India Pvt. Ltd. 174 Ayman Karar et al.  them an excellent candidate for application in high-speed optical interconnects, high-speed sampling, and ultra-high speed optical fibre communications.[1, 2] However, the surface reflectivity and the shadowing effect of the metal fingers prevent conventional MSM-PDs from achieving external quantum efficiency greater than 50% for equal electrode width and spacing. Recently several MSM-PD structures, driven by TM-polarized light, based on nano-patterning the metal fingers have been reported demonstrating substantial transmission enhancement through the excitation and guidance of surface plasmon polaritons (SPPs) into the photodetector slits.[3, 4] Since there is no cut-off wavelength for the fundamental TM-polarized slit mode, it is possible to achieve extraordinary transmission with almost any subwavelength slit width. However, since SPPs are TM-polarized mode, only the TM-polarization component of the incident light can be resonantly enhanced the transmission through the subwavelength slits. In this case, subwavelength slits act as polarization selector, which means that the penetration of the TE-polarized mode is suppressed. Furthermore, the TE-polarized mode intrinsically has a cut-off wavelength, making such MSM-PD structures polarization sensitive, and hence less attractive for applications requiring polarization insensitive operation. In this paper, we use the FDTD analysis to optimize a novel MSM-PD structure employing a dielectric thin layer waveguide deposited onto nano-patterned metal fingers. Our simulation results demonstrate 3-times enhancement in light transmission TE-polarized light in comparison with conventional MSM-PDs. DESIGN OF MSM-PD WITH ENHANCED TE-POARISATION TRANSMISSION  Recently, an MSM-PD structure based on the deposition of a dielectric layer on top of the metal fingers has been proposed by Nikitin et al. using the coupled mode method,[5] and subsequently developed by Guillaumée et al., who experimentally demonstrated transmission enhancement for TE-polarized light through a subwavelength slit.[6] However, such a structure is sensitive to two parameters, namely, the height of the dielectric layer as well as the periodicity of the nano-patterned metal grating, which were not fully optimised. In this paper, we investigate and optimize the key parameters of the dielectric-based MSM-PD structure, shown in Figure 1(a), to maximise the transmission of both the TE- and TM- polarized modes. The dielectric waveguide based MSM-PD structure consists of a subwavelength aperture of width Xw sandwiched between linear metal nano-gratings of heights hg, and a period (/). The entire structure is grown on top of a semiconductor substrate. The metal contact is covered with a thin dielectric film with height hWG. The presence of a thin dielectric layer on top of patterned metal gratings allows a TE-polarized incident light to couple to the dielectric waveguide modes and be guided towards the slit. At the same time, the extraordinary transmission of the TM-polarised light is maintained.  A 2D Finite Difference Time Domain (FDTD) software developed by Optiwave Inc was used to simulate the structure shown in Figure 1(a). A mesh step size of 10 nm was used in the simulation, with a time step satisfying the condition įt < 0.1įx/c, where įx is the mesh size and c is the speed of light. This high-resolution sampling yielded solutions that converged at reasonable computation times. The excitation field was modeled as a Gaussian-modulated Metal-Semiconductor-Metal Photodetector with Enhanced TE-Polarization Transmission 175  continuous plane wave in the x-direction. The anisotropic perfectly matched layer (APML) boundary conditions were applied in both the x- and z-directions to accurately simulate the light reflected off both sides, as well as the light reflected off the top and bottom surface of the MSM-PD structure. In all the simulations, the light wave was normally incident on the top surface of the metal nano-gratings site. The gold (Au) dielectric permittivity was defined by the Lorentz-Drude model [3] and the refractive index for the dielectric layer was chosen to be 2.3, mainly to demonstrate the concept of TE-polarized light transmission enhancement. The TE and TM transmission spectra for two MSM-PD structures (without a dielectric waveguide), one with and the other without metal nano-gratings, are shown in Figure 1(b). An essential difference between the spectra for the TM- and TE-polarizations is already noticeable for a single slit without metal nano-gratings. While for the TM-polarized mode the spectra show interlaced maxima associated with the Fabry-Perot slit waveguide resonance, for the TE-polarized mode resonance maxima are displayed, however, rapid fall-off, due to the slit mode cut-off, is seen at long wavelengths. Note that, no significant difference is seen in the TE-polarized mode transmission spectra for the structure with and without metal nano gratings. However, the TM mode is resonantly enhanced by using the nano-gratings. Figure1(c) shows the measured I-V characteristics for a nano-grating-patterned GaAs MSM-PD illuminated with 6.42 mW of laser power, for two input polarization states that correspond to the maximum, i.e. TM mode (dashed-dot), and minimum, i.e. TE mode (dashed), possible measured photocurrents, respectively. These results indirectly reveal the polarization dependent loss of the plasmonics-based MSM-PD device.  Fig. 1: a) 2-Dimensional Schematic of the Dielectric-Based MSM-PD Structure, b) Transmission Spectra of Two Structures without Dielectric Waveguides, for Fingers with and without Metal Nano-gratings, c) I-V Characteristics of the MSM-PD with Nano-gratings for TE- and TM-Polarized Input Laser Beams of Power 6.42 mW 176 Ayman Karar et al.  RESULTS AND DISCUSSION Several parameters of the dielectric-waveguide-based MSM-PD structure are optimized. These parameters are the nano-grating height, hg, nano-grating period, ȁ, waveguide height, hWG, duty cycle of the nano-gratings. Each parameter was varied over a certain range of values, while all other parameters were kept constant. Initially, we used the structure shown in Figure 1(a) with metal nano-gratings to optimize the waveguide height hWG. The dielectric waveguide height was varied, while keeping the subwavelength aperture width Xw and hg constant at 430 nm and 200 nm, respectively. Moreover, the duty cycle, grating period and pitch number were kept at 0.5, 830nm and 7, respectively. Figure 2(a) illustrates the TE-polarized transmission spectra with no dielectric waveguide, 150 nm, 200 nm and 250 nm waveguide height. It is apparent from Figure. 2 (a) that the dielectric waveguide not only affects the amount of the light flux transmitted through the slit, but also the peak resonance wavelength. This indicates that the dielectric layer allows the incident light to resonantly couple to the metal nano-gratings. As seen from Figure 2(a), the resonance peak is highly dependent on the waveguide height and is red-shifted with increasing the waveguide height. Keeping the dielectric waveguide height at 200 nm and the other parameters constant, the simulated TE-polarized transmission spectra is shown in Figure 2(b) for metal nano-grating height from 50 nm to 200nm. As seen in Figure 2(b) while the metal nano-grating height affects the TE-polarized light transmission flux, it has no impact on the resonance wavelength. It is also noticed that the transmission peak increases with decreasing the metal nano-grating height.   Fig. 2: Simulated TE-polarisation Transmission Spectra for Different  a) Dielectric Waveguide Height and, b) Nano-Grating Height with 430 nm Slit Width Figures 3(a and b) show the simulated TE-polarisation transmission spectra for different metal nano-grating periods, and duty cycles, for a slit width of 430 nm, a nano-grating height of 50 nm and a dielectric waveguide height of 200 nm. The duty cycle is defined as the ratio of the nano-grating line width to the period, ȁ. It is seen from Figure 3(a) that the resonance peak of the TE-polarised light transmission is red-shifted when the periodicity increases. The maximum attainable transmission peak occurs at 730 nm for a nano-grating period of 600 nm. It is noticed Metal-Semiconductor-Metal Photodetector with Enhanced TE-Polarization Transmission 177  from Figure 3(b) that the nano-grating duty cycle has a significant impact on both the transmission peak and the resonance wavelength, and that the resonance wavelength is red-shifted when the duty cycle increases, while the maximum transmission occurs when the duty cycle is 50%.    Fig. 3: Simulated TE-Polarisation Transmission Spectra for Different a) Periodicity and, b) Duty Cycle with 430 nm Slit width, 50 nm Nano-Grating Height and 200 nm Dielectric Waveguide Height  Fig. 4: a) Simulated TE-Polarisation Transmission Spectra and,  b) Simulated Power Distribution without (left) and with (right) Dielectric Waveguide The TE-polarized light transmission spectra are shown in Figure 4(a), for two optimized MSM-PDs with and without a dielectric waveguide (WG). It is obvious that the dielectric waveguide on top of the metal nano-gratings significantly enhances the TE-polarised light transmission, compared with the conventional MSM-PD device without a dielectric waveguide (NoWG). The resonance wavelength (corresponding to the highest transmission) is 755 nm for ȁ = 600 nm and the transmission enhancement is almost 3-times that of a conventional MSM-PD device without a dielectric waveguide. Moreover, as seen from Figure 4(a) the cut-178 Ayman Karar et al.  off wavelength is increased when the slit is filled with the dielectric. The simulated Sx poynting vectors, i.e. energy flowing along the x direction, are shown in Figures 4(b), for the MSM-PD without (left) and with (right) a dielectric waveguide. It is worthwhile noting that for an MSM-PD without a dielectric waveguide, the power transmitted into the active area of the semiconductor is insignificant, compared with the power transmitted for an MSM-PD with a dielectric waveguide. CONCLUSIONS  Finite difference time-domain (FDTD) method has been used to optimize the TE-polarized light transmission of a metal-semiconductor-metal photodetector (MSM-PD) employing a dielectric waveguide and metal nano-gratings. Simulation results have confirmed the dependence of the TE-polarized light through the MSM-PD nanoslit of the structure on the metal nano-grating height and dielectric waveguide height. TE-polarised light transmission enhancement of 3-times has been demonstrated through MDM-PD parameter optimisation. ACKNOWLEDGEMENTS We acknowledge the support of Edith Cowan University and the World-Class University Program funded by the Ministry of Education, Science, and Technology through the National Research Foundation of Korea (R31–10026). REFRENCES  [1] Soole.J. and Schumacher. H., “InGaAs Metal-Semiconductor-Metal Photodetectors for Long Wavelength Optical Communications,” IEEE J. Q. Elec., 27, 3,737–752, 1991.  [2] Liu. M.Y. and Chou. S.Y., “Internal emission metal-semiconductor-metal photodetectors on Si and GaAs for 1.3 ȝm detection,” Appl. Phys. Lett., 66, 2673 –2675, 1995.  [3] Karar. A., Das. N., Tan. C.L., Alameh. K., Lee. Y.T., and Karouta. F., “High-responsivity plasmonics-based GaAs metal-semiconductor-metal photodetectors,” Appl. Phys. Lett., 99, 33112–33112, 2011.  [4] Ren. F.F., Ang. K.W., Ye. J, Yu., M, Lo. G.Q., and Kwong. D.L., “Split Bull’s Eye Shaped Aluminum Antenna for Plasmon-Enhanced Nanometer Scale Germanium Photodetector,” Nano Lett., 11, 1289–93, 2011.  [5] Nikitin. A.Yu., Garcia-Vidal. F.J., and Martin-Moreno. L., “Enhanced optical transmission, beaming and focusing through a subwavelength slit under excitation of dielectric waveguide modes,” J. Opt. A: Pure Appl. Opt.,11, 2009.   [6] Guillaumée. M., Nikitin. A. Yu., Klein. M.J.K., Dunbar. L.A., Spassov. V., Eckert. R., Martín-Moreno. L., García-Vidal. F.J. and Stanley. R.P., “ Observation of enhanced transmission for s-polarized light through a subwavelength slit,”  Opt. Express, 18, 9, 9722–9727, 2010. 

Metal-semiconductor-metal photodetector with enhanced TE-polarization transmission

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Metal-semiconductor-metal photodetector with enhanced TE-polarization transmission

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