【中文摘要】 利用金属有机气相沉积技术生长ＩｎＧａＡｓＰ／ＩｎＰ多量子阱结构，通过改变生长程序，得到了优化的陡峭量子阱界面．并利用光致发光（ＰＬ）和Ｘ射线双晶衍射对其界面质量分析，Ｘ射线双晶衍射表明界面起伏为一个原子层厚度，在１０Ｋ温度下ＰＬ谱半峰高宽（ＦＷＨＭ）为７ｍｅＶ
【英文摘要】 Multi quantum well interface quality is one of key factors that affect device performance. Metalorganic vapor phase epitaxial (MOVPE) grown InGaAsP/InP multi quantum well structure are studied. Abruptness optimization of interfaces is carried out by means of a different gas switching sequences. Analysis of x-ray and photoluminescence (PL) are used to provide detailed information about the interfaces. Measured and simulated rocking curves of Xray diffraction show monolayer fluctuations at the interfaces...福建省青年重点基
