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A New Method for Wet Passivating of Porous Silicon
Authors
蔡贝妮
陈松岩
黄燕华
Publication date
1 January 2005
Publisher
厦门大学学报(自然科学版)编辑部
Abstract
采用硫代乙酰胺的HF酸水溶液作为氧化剂对初始多孔硅进行钝化处理,改善了多孔硅表面结构并提高了发光强度.同时研究了钝化电流,钝化温度和钝化时间等一系列因素对钝化多孔硅光致发光强度的影响.实验发现,在60℃恒温下,对样品通电流1mA/cm2,进行10min的钝化处理可以获得最强的光致发光,发光强度比初始样品发光强度增强了一个数量级.另外,通过傅立叶红外吸收谱(FTIR)以及X射线光电子能谱(XPS)测试分析,探讨了钝化处理使得多孔硅发光强度提高的原因.国家自然基金项目(60336010)资
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Last time updated on 16/06/2016