EnIn this study, we have investigated the effects of an XeCl308 nm excimer laser radiation on bacterial mutagenesis. Our experiments have revealed that the mutagenesis inducted by the XeCl308 nm excimer laser radiation is independent from RecA protein, the regulator of the SOS response, unlike UV254 nm radiation that is not mutagenic for Escherichia coli mutants lacking the RecA protein. This found suggests that the UV308 nm laser radiation might be mutagenic also in microorganisms naturally lacking the SOS response. To test this hypothesis, we applied our innovative mutagenesis approach on Nonomuraea ATCC 39727, an industrial strain producing an antibiotic, which is relatively refractory to UV254 nm radiation-induced mutagenesis. Our results demonstrated the efficiency of XeCl308 nm excimer laser radiation to induce mutagenesis in Nonomuraea ATCC 39727

Alifano, P.

Lorusso, A.

Nassisi, V.

Talà, A.

Tredici, M.

English

Università del Salento: ESE - Salento University Publishing

 8  Abstract  In this study, we have investigated the effects of an XeCl308 nm excimer laser radiation on bacterial mutagenesis. Our experiments have revealed that the mutagenesis inducted by the XeCl308 nm excimer laser radiation is independent from RecA protein, the regulator of the SOS response, unlike UV254 nm radiation that is not mutagenic for Escherichia coli mutants lacking the RecA protein. This found sug-gests that the UV308 nm laser radiation might be mutagenic also in microorganisms naturally lacking the SOS response. To test this hypothesis, we ap-plied our innovative mutagenesis approach on Nonomuraea ATCC 39727, an industrial strain pro-ducing an antibiotic, which is relatively refractory to UV254 nm radiation-induced mutagenesis. Our results demonstrated the efficiency of XeCl308 nm excimer laser radiation to induce mutagenesis in Nonomuraea ATCC 39727.   INTRODUCTION  Bacteria are excellent producers of several potent bioactive compounds. Many of the products currently used for human or animal therapy, in pharmaceutical and food industry and in agriculture are produced by microbial secondary metabolism or by chemical modification of a microbial products. However, it is rare for these microorganisms to pro-duce biological molecules at concentration so high as to initiate the production on an industrial scale. Therefore, an important challenge in industrial mi-crobiology is to improve the secondary metabolites production by microorganisms. Mutation-selection procedures are widely used in biotechnology to improve the performance of producer microorganisms. The mutagenic effects of ultraviolet (UV) light of microorganisms are fairly well known from studies with UV lamps. The interaction of UV light with cellular systems is re-sponsible for photochemical, photothermal, photo-A. Talà(1), A. Lorusso(2), M. Tredici(1), V. Nassisi(2), P. Alifano(1)   (1)Dipartimento di Scienze e Tecnologie Biologiche ed Ambientali, Laboratorio di Microbiologia - Università del Sa-lento, Via Provinciale Lecce-Monteroni, C.P. 193, 73100 Lecce, Italy (2)Dipartimento di Fisica, Laboratorio di Elettronica Applicata e Strumentazione, LEAS    INFN sez. di Lecce - Università del Salento, Via provinciale Lecce-Arnesano, C.P. 193, 73100 Lecce, Italy  Application of XeCl308nm excimer laser radiation to mutate in-dustrial microorganisms  decomposition and photodinamic processes. When short-wavelength radiation strikes biological mate-rial, DNA is damaged. It can be repaired or can cause cell killing, mutagenesis or, in mammalian cells, carcinogenesis [1-2]. Mutagenic and lethal mechanisms of UV254 nm radiation have been elucidated in several microor-ganisms. RecA, a multi-functional protein, plays a fundamental role in bacterial response to UV254 nm radiation [3-4]. Escherichia coli strains harboring loss-of-function mutations in recA gene are ex-tremely sensitive to far-UV by germicidal lamps [5]. DNA photoproducts are maximally represented by pyrimidine dimers, and it is believed they are responsible of the far-UV lethal effects [1]. The extreme sensitivity of recA-deficient strains to far-UV radiation is dependent on the inability to both repair DNA by means of the post-replicative re-combination pathway, and to activate additional error-free and error-prone (mutagenic) DNA repair pathways (the so-called SOS response) [6-7]. Ow-ing to the failure to activate the SOS response, recA-deficient strains are also inefficiency to UV254 nm-induced mutagenesis. This is a frequent condi-tion that limits diffusion of the UV254 nm mutagene-sis for research or industrial purposes because many strains are naturally SOS response-defective [8]. Since the eighties, due to the development of excimer lasers, new frontiers in the study of UV applications have been opened. In this context we, analyze the effects of the UV308 nm laser radiation generated by an homemade XeCl308 nm excimer la-ser [9], using E. coli, as a model organism, and Nonomuraea ATCC 39727, as a microorganism of industrial interest. Our experimental approach is also of wide interest because, in contrast to far-UV254 nm radia-tion, the environmental radiation band around 308 nm is only partially attenuated by the atmosphere and has a potential impact on biological systems. Moreover, studies of the biological effects of coher-ent (laser) radiation are rare in the literature, and, in particular, the response of recA-defective strains to  9  UV308 nm XeCl excimer laser radiation has not been investigated systematically before.   EXPERIMENTAL SETUP   Strains and Growth Conditions  The E. coli strains were grown in Luria-Bertani (LB) broth or LB agar. Nonomuraea sp. ATCC 39727 was obtained from the ATCC. The composition (per liter) of the complex media used in this study for Nonomuraea growth is listed be-low.  – Medium YS: 2 g yeast extract, 10 g soluble starch (pH 7.3)  – Medium 707: 5 g peptone, 3 g yeast extract, 1 g MgSO4 • 7 H2O (pH 7.0). When requested, agar was added at a concentration of 1.8%.  Irradiation of E. coli Strains by UV308 nm XeCl ecimer laser or UV254 nm germicidal lamp and UV-radiation survival tests  The E. coli strains were grown to late loga-rithmic phase (optical density = 1.0 at a wavelength of 550 nm) in LB broth at 37°C with vigorous shak-ing. Diluted and non diluted cells were plated on LB agar mini-plates (2 cm in diameter) and ex-posed to UV radiation using one of two sources: a UV308 nm XeCl excimer laser or a UV254 nm germi-cidal lamp. The laser fluences were fixed at 25 or 50 mJ cm-2 per laser shot, and the laser beam was focused on the surface of the mini-plates using a convergent lens. We administered multiple laser shots of the same fluence. Surviving cells were quantified after overnight incubation at 37°C by counting the number of colony-forming units at the different dilutions. In our experiments, we verified preliminarily that the laser treatment did not signifi-cantly increase the temperature of the biological samples excluding thermal effects. Indeed, using a platinum probe (Pt-RTD l00Ω) inside the agar plates next to the irradiated surface, we observed a maximum increment of 1.85°C after 500 laser shots (at 1 Hz repetition rate). In parallel experiments, E. coli strains were irradiated with the UV254 nm germi-cidal lamp at a radiance of 0.3 mJ cm-2s-1. Irradia-tion was performed by opening the LB agar mini-plates under a SpectrolineR model ENF-260C/F UV(254) germicidal lamp (Spectronics Corporation, Westbury, NY) at a distance of 15 cm for different times in the absence of daylight illumination. As a control, dilutions from the same cultures were spot-ted onto non irradiated plates. UV-light fluences were measured by a light-sensitive photodiode (S1336-I8BQ). Exposure to the germicidal lamp during our experiments never resulted in an in-crease in the temperature of the LB agar medium by more than 0.1°C, as measured by a platinum  probe (Pt-RTD 100 Ω) that was placed at the surface of the medium.  Determination of Spontaneous and UV-Radiation-lnduced Mutation Frequencies in E. coli  E. coli cells grown to an optical density of 1.0 at a wavelength of 550 nm were collected by centrifugation and gently resuspended in LB broth to concentrate them. To determine UV308 nm-radiation-induced mutation frequencies, 0.45-µm pore-sized White HAWP Millipore membranes were placed on the surface of LB agar mini-plates (2 cm in diameter). Bacteria (about 2 x 1010 cells) were plated onto membranes and exposed to the UV-radiation. Exposure was carried out at room temperature in the absence of daylight illumination. After irradiation, bacteria were incubated at room temperature for 30 min to allow the cells to recover and repair UV radiation damage. Then the Milli-pore membranes were removed and transferred onto LB agar mini-plates supplemented with rifam-picin (36 µg ml-1) and incubated at 37°C for 24h. Serial dilutions were treated in parallel and plated on LB agar mini-plates to determine the viable col-ony-forming units. Mutation frequencies were de-termined by dividing the number of resistant colony forming units ml-1 by the total number of viable colony-forming units ml-1. For statistical analysis, the data were obtained from three independent ex-periments. In each experiment, 10 independent cul-tures of each strain were tested, and median values of mutation frequencies to rifampicin resistance were determined. For each strain subjected to a given UV308 nm- or UV254 nm- radiation treatment, the median values did not differ more than 20%.  Irradiation of Nonomuraea spores by UV308nm XeCl excimer laser and survival tests  Nonomuraea sp.ATCC 39727 spores (about 5 × 108ml−1) were collected by centrifugation and re-suspended in medium 707 (for re-hydration). Non-diluted or diluted spores (10µl) were then plated on YS agar mini-plates (2 cm diameter) ex-posed to UV308 nm radiation. The laser fluences were fixed at 25 or 50 mJ/cm2 per laser shot, and the la-ser beam struck the surface of the mini-plates thank Fig. 1.  Experimental apparatus utilised for cells irradiation.  10  by a convergent lens. Figure 1 shows the experi-mental apparatus. We applied laser shots of the same fluence for different times. Survived cells were quantified following over-night incubation at 37 °C, by counting the number of colonies forming units (cfu) at the different dilutions. Because of the high fluences used in our experiments, we prelimi-narily verified that the laser treatment did not in-crease significantly the temperature of the biologi-cal samples excluding thermal effects. Using a platinum probe (Pt-RTD 100Ω) inside the agar plates next to the irradiation surface, we observed a maximum increment of 1.85 °C after 500 laser shots (at 1Hz repetition rate). After irradiation, samples were incubated at 28 °C for two weeks to determine the viable cfu.   Determination of spontaneous and UV308nm-induced mutation frequencies in Nonomuraea spores  Nonomuraea spores were irradiated on solid surface. This procedure was necessary to obtain effective mutagenesis by UV308 nm. In order to per-form the irradiation, 0.45 µm-pore sized White HAWP Millipore membranes were placed on the surface of YS agar mini-plates (2 cm diameter). Non-diluted (about 5 × 108 ml−1) or diluted spores (10µl) were plated onto membranes and exposed to XeCl excimer laser. Exposure was carried out at a room temperature, in the absence of daylight illu-mination. After irradiation, spores were incubated at room temperature for 30 min to allow the cells to recover and repair UV damage. Subsequently, the Millipore membranes were removed and transferred onto YS agar mini-plates (2 cm diameter) supple-mented with streptomycin (50 µg ml−1) or in control YS agar mini-plates without antibiotic, and incu-bated at 28°C for two weeks. Mutation frequencies were determined by dividing resistant cfu ml-1 by the total viable cfu ml-1. For statistical analysis, data were obtained by three independent experi-ments. In each experiment, 10 independent cultures of each strain were tested and median values of mu-tation frequencies to rifampicin resistance were de-termined.    RESULT AND CONCLUSION   We started our study by determining the ef-fect of UV254 nm radiation of E. coli strains. The strain JC1553 harbours the recA mutation and it is congenic to the recA-proficient strain JC411. The results confìrmed previous data on the extreme far-UV-radiation sensitivity of strains carrying the recA mutation as a result of the inability to repair UV-radiation-induced damage to DNA [10-11]. At UV254 nm-radiation doses ranging between 0 and 9 mJ cm-2 and in the absence of photoreactivation, the survival curves had complex shapes that were dis-tinct in recA-proficient and in recA-defective strains. In the recA-proficient strain, the decrease in survival as a function of UV254 nm-radiation dose was smaller at lower doses (<3 mJ cm-2) than at higher doses (>3 mJ cm-2). An opposite behavior was observed in the recA-defective strains, which showed less effect at higher doses (> 1 mJ cm-2) than at lower doses (< 1 mJ cm-2) (Figure 2 A). In parallel experiments E. coli strains were subjected to UV308 nm coherent radiation. In the sur-vival plot, a net change in the slope was apparent at doses higher than 5000 mJ cm-2; cell killing in-creased only slightly with further increasing in UV308 nm-radiation dose. The same effect was ob-served with the recA-defective strain at about the same doses (Figure 2 B).  The different behaviors of the recA-defective strain after exposure to the germicidal lamp or to the excimer laser suggested that there were differ-ent lethal and genotoxic mechanisms for the two UV-radiation sources. To better elucidate this dif-ference, we analyzed the mutability of recA-Fig. 2. Survival of recA-proficient and recA-defective E. coli strains exposed to lamp-generated UV254 nm radiation (A) and to excimer laser-generated UV308 nm radiation (B). Surviving fraction are plotted as a function of UV radiation dose. A B Application of XeCl308nm excimer laser radiation to mutate industrial microorganisms  11  proficient and recA-defective strains upon exposure to the UV308 nm excimer laser radiation. Frequency of mutation to rifampicin resistance was used as a parameter of the mutability. Under our experimental conditions, the recA-defective strain JC1553 exhibited spontaneous mu-tation levels that were a little higher (about two- to three-fold) than the congenic recA-proficient strain JC411 (Table 1). As expected, the laser treatment resulted in more than a fivefold increase in muta-tion frequencies to rifampicin resistance in JC411 (recA-proficient) at doses higher than 2500 mJ cm-2. In particular, the maximal increment, 6.2-fold, was observed at 2500 mJ cm-2 with a surviving fraction of 7xl0-2. Unexpectedly, the UV308 nm laser A. Talà, A. Lorusso, M. Tredici, V. Nassisi, P. Alifano treatment was much more mutagenic for JC1553 (recA) than for JC411, resulting in an impressive increase in mutation frequencies as a function of dose. At 2400, 3600 and 6000 mJ cm-2 the incre-ment was 720-, 1200- and 1900-fold, respectively (Table 2).  The greater mutagenic effect of the laser compared to the lamp in the recA genetic back-ground may be due to the different DNA photo-chemistry of the two radiation sources. It is gener-ally assumed that, in contrast to far-UV radiation, the effects of near-UV radiation on DNA are mostly indirect and are mediated by photosensitiz-ers [1]. Cellular DNA exposed to near-UV radiation plus sensitizers is damaged in a variety of ways,   12  with DNA strand breaks and interstrand crosslinks being the most common effects. Photoproducts of the aromatic amino acids phenylalanine, tyrosine and tryptophan act as major sensitizers for the action of near-UV radiation [14]. Near-UV-radiation photolysis of tryptophan re-leases superoxide ions and hydrogen peroxide and the near-UV-radiation photoproducts of tryptophan are especially toxic for recombination-deficient mutants [15]. This found suggests that the UV308 nm radia-tion might also be mutagenic in microorganisms naturally lacking the SOS response, a condition that frequent limits the diffusion of the UV254 nm-radiation-induced mutagenesis for research or in-dustrial purposes [8], and it encourages the setting of new mutagenesis protocols based on XeCl exci-mer laser radiation. To value this hypothesis, in this study, we have determined the effect of UV308 nm radiation on survival of Nonomuraea ATCC 39727 spores. Re-sults demonstrated a moderate sensitivity of the strain to the radiation (Figure 3). Survival was about 2.7 x 10−3 at values of about 5000 mJ cm-2. After determining the survival curve, we analyzed the mutability of Nonomuraea ATCC 39727 upon exposure to the UV308 nm excimer laser radiation. Mutation frequency to streptomycin resistance was used as a parameter of the mutability. Doses rang-ing between 0 and 2500 mJ cm-2 were used, being the survival fraction at values >2500 mJ/cm2 too small (<10%) to obtain a statistically significant number of viable mutants. Results demonstrated the efficiency of the UV308 nm laser mutagenesis with a microorganism that, as well as other actinomycetes [8], is relatively refractory to mutagenesis by UV254nm radiation generated by germicidal lamps. Mutation frequencies increased as a function of the dose. At about 2500 mJ cm-2, the mutation frequency was about 15-fold higher than in the con-trol (un-irradiated) sample, and the survival fraction approximated 10% (Figure 4). In conclusion, using recA-proficient and recA-defective E. coli strains, we have demonstrated that the UV308 nm laser radia-tion is mutagenic also in microorganisms lacking the SOS response. Indeed, the application of UV308nm laser mutagenesis protocol to select Nono-muraea ATCC 39727 streptomycin-resistant mu-tants has been very effective at variance with UV254 nm radiation which is not mutagenic for this indus-trial strain. Further studies will be necessary to elu-cidate the molecular mechanism by which UV308 nm radiation induces mutagenesis in microorganisms naturally SOS-defective. Nevertheless, our results have relevant applicative potentialities to improve mutagenesis-selection procedures for research and industrial purposes.    REFERENCES  [1] J. Cadet, C. Anselmino, T. Douki, L. Voitu-riez, J. Photochem. Photobiol. B., 15 (1992) 277-98. [2] M.F. Goodman, Annu. Rev. Biochem., 71 (2002) 17-50. [3] C. Prevost, M. Q. Takahashi, Rev. Biophys., 36 (2003) 429–453. [4] K.C. Smith, Bioessays, 26 (2004), 1322–1326. [5] A.J. Clark, Bioessays, 18 (1996), 767–772. [6] L.N.Csonka, A.J.Clark, Genetics, 93 (1979), Fig. 3. Survival of Nonomuraea ATCC 39727 spores exposed to exci-mer laser-generated UV308 nm radiation. Survival fractions and standard deviations are plotted as a function of UV308 nm dose.  Fig. 4. Mutation frequency to streptomycin-resistance of Nonomuraea ATCC 39727 exposed to excimer laser-generated UV308 nm radiation. Values represent means and standard deviations of the median values obtained in the three independent experiments. Application of XeCl308nm excimer laser radiation to mutate industrial microorganisms   13  321–343. [7] S.C. Kowalczykowski, Biochimie, 73 (1991), 289–304. [8] T. Kieser, M.J. Bibb, M.J. Buttner, K.F. Chater, D.A. Hopwood, The John Innes Foundation Crowes: Norwich, England, (2000). [9] V. Nassisi, Appl. Phys. B., 53 (1991) 14-18. [10] L.N. Csonka,  A.J. Clark, Genetics, 93 (1979)321-43. A. Talà, A. Lorusso, M. Tredici, V. Nassisi, P. Alifano [11] S.C. Kowalczykowski, Biochimie, 73 (1991) 289-304.  [12] A. Miura,  J.I. Tomizawa,  Mol. Gen. Genet., 103 (1968) 1-10. [13] T. Kato, R.H. Rothman, A.J. Clark, Genetics, 87 (1977) 1-18. [14] J. Craggs, S.H. Kirk, S.I. Ahmad, J. Photo-chem. Photobiol. B., 24 (1994) 123-8. [15] G. Yoakum, A. Eisenstark, R.B. Webb,  Ba-sic Life Sci., 5B (1975) 453-8.   

Application of XeCl308nm excimer laser radiation to mutate industrial microorganisms

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Application of XeCl308nm excimer laser radiation to mutate industrial microorganisms

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