Schichten aus kubischem Bornitrid. Teilprojekt: Beschichten von Wendeschneidplatten mit kubischem Bornitrid durch chemoreaktive Verfahren und deren Erprobung Abschlussbericht

Abstract

The deposition of thin layers of cubic boron nitride requires a ion bombardement of certain energy. For flat substrates high biased PVD methods are well established. Using substrates of complicated shapes like indexable inserts CVD methods are more suitable. In this project the plasma activated CVD for the deposition of boron nitrid were investigated. The experiments were based on thermodynamical calculations of the CVD processes. Adherend coatings of boron nitride were deposited on indexable inserts and other substrate materials at temperatures of 650 C to 880 C. The coating properties depends on different parameters, especially from the voltage and the density of the ion current. The coatings have a amorphous structure with nanocristalline particles of the hexagonal and cubic phase. The cutting performance of inserts coated with these boron nitride were improved considerably in machining stainless steel. (orig.)Available from TIB Hannover: RN 3212(2170)+a / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekSIGLEBundesministerium fuer Bildung, Wissenschaft, Forschung und Technologie, Bonn (Germany)DEGerman