Gaishun, V. E.

Kimlenka, I. M.

Kosenok, Ya. A.

Savitskaya, T. A.

Shakhno, E. A.

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Stability and rheology of silica suspensions  stabilised by surface active substances

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Stability and rheology of silica suspensions 
stabilised by surface active substances  
T. A. Savitskaya, I. M. Kimlenka, E. A. Shakhno, V. E. Gaishun, Ya. A. Kosenok 
 Belarusian State University, Minsk, Belarus 
Gomel State University, Gomel, Belarus  
e-mail: savitskayata@bsu.by  
Suspensions based on nanosized silica modified by ionogenic and nonionogenic surfactants 
have been obtained. The dispersion composition, stability and rheological properties have been 
investigated. Laser diffraction method, scanning electron microscopy and R/S Brookfield rhe-
ometer system have been used for the description of the suspensions under study. The influence 
of different surfactants on the dispersion composition, stability and rheological properties of 25 
wh. % OX-50 suspensions has been investigated. The comparison of rheological properties of 
aerosol suspension stabilized by ethylenglycol as a low molecular weight stabilizer and by poly-
ethylenglycol as a high molecular weight stabilizer showed that the viscosity of suspension is 
higher for the last one. The more shear rate the higher suspensions’ viscosity is observed in both 
cases. This phenomenon is known as a dilatancy [1]. Modification of suspension by anionogenic 
surfactant (sodium dodecylsulfate with concentration under critical concentration of micelle 
formation, CCM) promotes the formation of the stable suspension containing 49 wh. % disper-
sion phase while modification by nonionogenic surfactant (glycerin monooleate with concentra-
tion above CCM) promotes the formation of the stable suspension containing 39 wh. % disper-
sion phase. As follows from the data of figure the space network of aggregated aerosol particles 
is formed in the suspension stabilized by glycerin monooleate. In contrast to it the stabilization 
by sodium dodecylsulphate results in the homogeneous distribution of particles in the volume of 
suspension. The residue of this suspension has compacted structure after drying. The findings 
can be applied for developing the technology of synthesis of concentrated stable suspensions 
used for chemical-mechanical polishing of semiconductor plates [2]. 
     
         
Fig. SEM-image of dried residues of aerosol suspensions: 
49.1 ± 0.1 % stabilized by sodium dodecylsulphate (left);  
38.7 ± 0.1 % stabilized by monooleate glycerin (right) 
 
References 
1. F. J. Galindo-Rosales, F. J. Rubio-Hernández, J. F. Velázquez-Navarro. Rheologica Acta (2009) 48. 
2. Chemical Mechanical Polishing in Silicon Processing: Semiconductors and semimetals / Ed. By Shin 
Hwa Li, R.O. Miller. (2000). 
 


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Stability and rheology of silica suspensions stabilised by surface active substances

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