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Synthesis of μc-Si thin films from SiH2Cl2 utilizing the low-pressure high-density microwave plasma: role of chlorine in the growth of μc-Si thin films
Authors
Hamada Kazu
Tomohiro Kobayashi
+4Â more
Naoyuki Ohse
Jhantu Kumar Saha
Hajime Shirai
Y. Takemura
Publication date
Publisher
Japan Society of Applied Physics
Abstract
Abstract not available
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Last time updated on 26/05/2016