University of Canterbury. Electrical and Computer Engineering
Abstract
Surface texturing is an effective and more lasting
technique in reducing reflections and improving light
trapping compared to antireflection coatings. A surface
texturing technique using Reactive Ion Etching (RIE)
method suitable for crystalline and multi crystalline solar
cells, which resulted in surfaces with negligible reflection
in the visible band is described.
Different texturing structures (pillars, holes and black
silicon) have been studied and compared in the
wavelength range from 250nm-2500nm. It is found that
the reflectance of the textured column structures were
less than 0.4% at wavelengths from 500nm to 1000nm
and showed a minimum of 0.29% at 1000 nm while the
reflectivity from black silicon is around 1% and hole
structures is around 6.8% in the same wavelength range