高能Ar离子辐照聚酯薄膜潜径迹蚀刻
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Abstract
通过对０００ＭｅＶＡｒ离子辐照聚酯（ＰＥＴ）薄膜潜径迹蚀刻过程的研究，给出了表征ＰＥＴ聚合物材料特性的径迹可蚀刻性的能损阈值（ｄＥ／ｄＸ）ｃ，并通过不同方法讨论了ＰＥＴ膜的径迹蚀刻速度和体蚀刻速度。The energy loss effect in the latent track etching process of PET films irradiated by 900MeV argon ions is discussed. The critical energy-Ioss rate (dE/dX). which is characteristic of the material(PET) is also given. The bulk etching rate Vb and track etching rate Vt are obtained with different methods
