Simulation and dielectric characterization of reactive dc magnetron cosputtered (Ta[sub 2]O[sub 5])[sub 1−x](TiO[sub 2])[sub x] thin films

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Publication date
1 January 2002
Publisher
American Vacuum Society
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      oaiinfo:doi/10.1116%2F1.1470508
      Last time updated on 23/04/2021