The effect of fluorine atoms on silicon and fluorocarbon etching in reactive ion beam etching

Authors
Publication date
1 July 1987
Publisher
American Vacuum Society
Doi

    Abstract

    Abstract is not available.

      Similar works

      Full text

      thumbnail-image

      Available Versions

      Crossref

      redirect
      oaiinfo:doi/10.1116%2F1.574491
      Last time updated on 23/04/2021