Thin and Dense Ceramic Coatings by Plasma Spraying at Very Low Pressure

Abstract

The very low pressure plasma spray (VLPPS) process operates at a pressure range of approximately 100 Pa. At this pressure, the plasma jet interaction with the surrounding atmosphere is very weak. Thus, the plasma velocity is almost constant over a large distance from the nozzle exit. Furthermore, at these low pressures the collision frequency is distinctly reduced and the mean free path is strongly increased. As a consequence, at low pressure the specific enthalpy of the plasma is substantially higher, but at lower density. These particular plasma characteristics offer enhanced possibilities to spray thin and dense ceramics compared to conventional processes which operate in the pressure range between 5 and 20 kPa. This paper presents some examples of gas-tight and electrically insulating coatings with low thicknesses < 50 mu m for solid oxide fuel cell applications. Furthermore, plasma spraying of oxygen conducting membrane materials such as perovskites is discussed