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Time- and space-resolved high-throughput characterization of stresses during sputtering and thermal processing of Al–Cr–N thin films
Authors
A Ludwig
A Siegel
+6 more
D Grochla
D König
H Brunken
M Kieschnick
P J S Buenconsejo
S Hamann
Publication date
1 February 2013
Publisher
IOP Publishing
Doi
Abstract
Abstract is not available.
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info:doi/10.1088%2F0022-3727%2...
Last time updated on 22/04/2021
