Surface and sub-surface oxidation of thin films using Low Energy Ion Scattering

Abstract

Ru and ZrN are candidate capping layers for applications such as catalysis, electronics and optical coatings: Ru exhibits a low resistivity, high thermal stability, excellent oxidation resistance and good diffusion capabilities. ZrN is thermally stable, and is known for its good mechanical properties. Although the oxidation process has been studied for both materials, the surface and especially the sub-surface oxidation is not properly understood and well addressed. We use the sub-monolayer surface sensitivity of the low energy ion scattering (LEIS) technique for in-situ monitoring of surface oxidation and determination of the oxygen sticking probabilities. From the LEIS in-depth signal, sub-nanometer sub-surface oxidation can be determined as a function of time and from these data oxygen diffusion constants can be extracted. These data support the applications for which adequate protecting surface films are required. i) Author to whom correspondence should be addressed. Electronic mail: [email protected]