Accurately gauge the optimal machine setting for MicroChem S1805 using the Heidelberg DWL 66+ and obtain contrast curves based on the 2mm and 10mm writehead

Lopez, Gerald G

Wood, Steven

English

Kosmopolis

University of Pennsylvania
ScholarlyCommons
Protocols and Reports Browse by Type
2-4-2016
Heidelberg DWL66+ S1805 Contrast Curves
Steven Wood
University of Pennsylvania, stewood@seas.upenn.edu
Gerald G. Lopez
University of Pennsylvania, lopezg@seas.upenn.edu
Follow this and additional works at: http://repository.upenn.edu/scn_protocols
Part of the Electronic Devices and Semiconductor Manufacturing Commons, and the
Nanotechnology Fabrication Commons
This paper is posted at ScholarlyCommons. http://repository.upenn.edu/scn_protocols/15
For more information, please contact repository@pobox.upenn.edu.
Wood, Steven and Lopez, Gerald G., "Heidelberg DWL66+ S1805 Contrast Curves", Protocols and Reports. Paper 15.
http://repository.upenn.edu/scn_protocols/15
Heidelberg DWL66+ S1805 Contrast Curves
Summary/Description
Accurately gauge the optimal machine setting for MicroChem S1805 using the Heidelberg DWL 66+ and
obtain contrast curves based on the 2mm and 10mm writehead.
Keywords
S1805
Disciplines
Electronic Devices and Semiconductor Manufacturing | Nanotechnology Fabrication
This technical report is available at ScholarlyCommons: http://repository.upenn.edu/scn_protocols/15
 
Standard Operation Procedure Document No: 
Revision: 
Heidelberg DWL66+ S1805 Contrast Curves Author: Steven Wood, Gerald Lopez 
 
 
 Page 1 
Goal:  
 Accurately gauge the optimal dose for MicroChem S1805 using the Heidelberg DWL 66+. 
 
Materials: 
 Microchem S1805 Photoresist 
 SurPass 4000 Primer (http://www.discheminc.com/) 
 Microchem MF-319 Developer 
 Acetone 
 Isopropyl Alcohol (IPA) 
 4 inch Silicon Wafers 
Equipment: 
 Torrey Pines Scientific hotplate 
 Reynoldstech 1000 RPM/second spinner 
 Heidelberg DWL-66+ Laser Writer using the 2mm and 10mm write head with 1%,12.5%,25%, and 50% 
power filters. Laser wavelength: 355nm. 
Protocol: 
 Prime 
1. Mount wafer and ensure that it is centered. 
2. Deposit 7 milliliters of SurPass 4000 in the center of the wafer. 
3. Spin on primer at 3000 RPM for 45 seconds. 
4. Rinse with IPA with 15 seconds left on the spin cycle. 
Coat 
1. Mount wafer and ensure that it is centered. 
2. Deposit 7 milliliters of S1805 photoresist in the center of the wafer. 
3. Spin on photoresist at 4500 RPM for 60 Seconds. 
 Soft Bake 
1. Bake wafer at 115 °C for 60 seconds. 
 Expose 
1. Expose two separate wafers 8 times each for a total of 16 exposures using every power filter (as 
well as no filter) for both the 2mm write head and 10mm write head. Each of the 16 exposures 
consists of 10 squares; each assigned an exposure dose from 40% to 100% with 10% gradations to 
further expand the data. 
 Develop 
1. Dispense approximately 150 milliliters of MF-319 developer into a six inch cylindrical container. 
2. Fully submerge the exposed wafer. 
3. Agitate and develop the wafer for 60 seconds.  
 
Standard Operation Procedure 
S1805 DWL-66+ Contrast Data 
 
Document No.: Revision: 
Author: Steven Wood url:  Page 2 
Results: 
 
 
 
0
0.05
0.1
0.15
0.2
0.25
0.3
0.35
0.4
0.45
0 0.2 0.4 0.6 0.8 1 1.2
R
e
si
st
 R
e
m
ai
n
in
g 
(u
m
)
Power (mW)
S1805 2mm Write Head Dose vs Resist Remaining 
0
0.05
0.1
0.15
0.2
0.25
0.3
0.35
0.4
0.45
0 2 4 6 8 10 12 14 16 18
R
e
si
st
 R
e
m
ai
n
in
g 
(u
m
)
Power (mW)
S1805 10mm Write Head Dose vs Resist Remaining 


Heidelberg DWL66+ S1805 Contrast Curves

ScholarlyCommons@Penn

University of PennsylvaniaScholarlyCommonsProtocols and Reports Browse by Type2-4-2016Heidelberg DWL66+ S1805 Contrast CurvesSteven WoodUniversity of Pennsylvania, stewood@seas.upenn.eduGerald G. LopezUniversity of Pennsylvania, lopezg@seas.upenn.eduFollow this and additional works at: http://repository.upenn.edu/scn_protocolsPart of the Electronic Devices and Semiconductor Manufacturing Commons, and theNanotechnology Fabrication CommonsThis paper is posted at ScholarlyCommons. http://repository.upenn.edu/scn_protocols/15For more information, please contact repository@pobox.upenn.edu.Wood, Steven and Lopez, Gerald G., "Heidelberg DWL66+ S1805 Contrast Curves", Protocols and Reports. Paper 15.http://repository.upenn.edu/scn_protocols/15Heidelberg DWL66+ S1805 Contrast CurvesSummary/DescriptionAccurately gauge the optimal machine setting for MicroChem S1805 using the Heidelberg DWL 66+ andobtain contrast curves based on the 2mm and 10mm writehead.KeywordsS1805DisciplinesElectronic Devices and Semiconductor Manufacturing | Nanotechnology FabricationThis technical report is available at ScholarlyCommons: http://repository.upenn.edu/scn_protocols/15 Standard Operation Procedure Document No: Revision: Heidelberg DWL66+ S1805 Contrast Curves Author: Steven Wood, Gerald Lopez    Page 1 Goal:   Accurately gauge the optimal dose for MicroChem S1805 using the Heidelberg DWL 66+.  Materials:  Microchem S1805 Photoresist  SurPass 4000 Primer (http://www.discheminc.com/)  Microchem MF-319 Developer  Acetone  Isopropyl Alcohol (IPA)  4 inch Silicon Wafers Equipment:  Torrey Pines Scientific hotplate  Reynoldstech 1000 RPM/second spinner  Heidelberg DWL-66+ Laser Writer using the 2mm and 10mm write head with 1%,12.5%,25%, and 50% power filters. Laser wavelength: 355nm. Protocol:  Prime 1. Mount wafer and ensure that it is centered. 2. Deposit 7 milliliters of SurPass 4000 in the center of the wafer. 3. Spin on primer at 3000 RPM for 45 seconds. 4. Rinse with IPA with 15 seconds left on the spin cycle. Coat 1. Mount wafer and ensure that it is centered. 2. Deposit 7 milliliters of S1805 photoresist in the center of the wafer. 3. Spin on photoresist at 4500 RPM for 60 Seconds.  Soft Bake 1. Bake wafer at 115 °C for 60 seconds.  Expose 1. Expose two separate wafers 8 times each for a total of 16 exposures using every power filter (as well as no filter) for both the 2mm write head and 10mm write head. Each of the 16 exposures consists of 10 squares; each assigned an exposure dose from 40% to 100% with 10% gradations to further expand the data.  Develop 1. Dispense approximately 150 milliliters of MF-319 developer into a six inch cylindrical container. 2. Fully submerge the exposed wafer. 3. Agitate and develop the wafer for 60 seconds.   Standard Operation Procedure S1805 DWL-66+ Contrast Data  Document No.: Revision: Author: Steven Wood url:  Page 2 Results:    00.050.10.150.20.250.30.350.40.450 0.2 0.4 0.6 0.8 1 1.2Resist Remaining (um)Power (mW)S1805 2mm Write Head Dose vs Resist Remaining 00.050.10.150.20.250.30.350.40.450 2 4 6 8 10 12 14 16 18Resist Remaining (um)Power (mW)S1805 10mm Write Head Dose vs Resist Remaining 

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Heidelberg DWL66+ S1805 Contrast Curves

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