Techniques for Low Voltage Scanning Electron Microscopy Linewidth Measurements

Abstract

Present scanning electron microscopy (SEM) linewidth measurement systems, although state of the art , require better defined techniques in deriving operating parameters for precision measurements. Experiments were performed to check techniques used on cleaved and uncleaved specimens, void of conductive coatings to obtain optimum SEM operating parameters, and the variations in results due to changes in system operating conditions. In addition, a method was devised to select and use different calibration standards and evaluate SEM linewidth measurement systems

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