In this paper, using the same geometrical approach than for the (2R3x2R3)
R30{\deg} structure (H. Jamgotchian et al., 2015, Journal of Physics. Condensed
Matter 27 395002), for the (R13xR13)R13.9{\deg} type II structure, we propose
an atomic model of the silicene layer based on a periodic relaxation of the
strain epitaxy. This relaxation creates periodic arrangements of perfect areas
of (R13xR13)R13.9{\deg} type II structure surrounded by defect areas. A
detailed analysis of the main published experimental results, obtained by
Scanning Tunneling Microscopy and by Low Energy Electron Diffraction, shows a
good agreement with the geometrical model.Comment: 20 pages, 9 figure