Electron beam ion sources (EBISs) are ion sources that work based on the
principle of electron impact ionization, allowing the production of very highly
charged ions. The ions produced can be extracted as a DC ion beam as well as
ion pulses of different time structures. In comparison to most of the other
known ion sources, EBISs feature ion beams with very good beam emittances and a
low energy spread. Furthermore, EBISs are excellent sources of photons (X-rays,
ultraviolet, extreme ultraviolet, visible light) from highly charged ions. This
chapter gives an overview of EBIS physics, the principle of operation, and the
known technical solutions. Using examples, the performance of EBISs as well as
their applications in various fields of basic research, technology and medicine
are discussed.Comment: 37 pages, contribution to the CAS-CERN Accelerator School: Ion
Sources, Senec, Slovakia, 29 May - 8 June 2012, edited by R. Baile