We report reduced contact resistance of single-layer graphene devices by
using ultraviolet ozone (UVO) treatment to modify the metal/graphene contact
interface. The devices were fabricated from mechanically transferred, chemical
vapor deposition (CVD) grown, single layer graphene. UVO treatment of graphene
in the contact regions as defined by photolithography and prior to metal
deposition was found to reduce interface contamination originating from
incomplete removal of poly(methyl methacrylate) (PMMA) and photoresist. Our
control experiment shows that exposure times up to 10 minutes did not introduce
significant disorder in the graphene as characterized by Raman spectroscopy. By
using the described approach, contact resistance of less than 200 {\Omega}
{\mu}m was achieved, while not significantly altering the electrical properties
of the graphene channel region of devices.Comment: 17 pages, 5 figure